MECHANISTIC ROLE OF H2O AND THE LIGAND IN THE
CHEMICAL-VAPOR-DEPOSITION OF CU,CU2O, CUO, AND CU3N FROM
BIS(1,1,1,5,5,5-HEXAFLUOROPENTANE-2,4-DIONATO)COPPER(II)

J 1995

MECHANISTIC ROLE OF H2O AND THE LIGAND IN THE CHEMICAL-VAPOR-DEPOSITION OF CU,CU2O, CUO, AND CU3N FROM BIS(1,1,1,5,5,5-HEXAFLUOROPENTANE-2,4-DIONATO)COPPER(II)

PINKAS, Jiří, J. C. HUFFMAN, D. V. BAXTER, M. H. CHISHOLM, K. G. CAULTON et. al.

Základní údaje

Originální název

MECHANISTIC ROLE OF H2O AND THE LIGAND IN THE CHEMICAL-VAPOR-DEPOSITION OF CU,CU2O, CUO, AND CU3N FROM BIS(1,1,1,5,5,5-HEXAFLUOROPENTANE-2,4-DIONATO)COPPER(II)

Autoři

PINKAS, Jiří, J. C. HUFFMAN, D. V. BAXTER, M. H. CHISHOLM a K. G. CAULTON

Vydání

Chem. Mater. Washington DC, American Chemical Society, 1995, 0897-4756

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10402 Inorganic and nuclear chemistry

Stát vydavatele

Spojené státy

Utajení

není předmětem státního či obchodního tajemství

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

DEVICE-QUALITY COPPER; BETA-DIKETONATE COMPLEXES; HELIUM CARRIER GAS; FILM GROWTH;THIN-FILMS; CALCIUM DIPIVALOYLMETHANATES; OXIDE SUPERCONDUCTORS;MOLECULAR-STRUCTURE; HYDROGEN-BONDS; METAL-OXIDES

Štítky

BETA-DIKETONATE COMPLEXES, CALCIUM DIPIVALOYLMETHANATES, DEVICE-QUALITY COPPER, FILM GROWTH, HELIUM CARRIER GAS, HYDROGEN-BONDS, METAL-OXIDES, MOLECULAR-STRUCTURE, OXIDE SUPERCONDUCTORS, THIN-FILMS

Změněno: 15. 8. 2001 11:55, prof. RNDr. Jiří Pinkas, Ph.D.

Anotace

V originále

The mechanism of chemical vapor deposition of Cu, Cu2O, CuO, and Cu3N from Cu(hfacac)(2)(H2O) was studied by XRD, MS, FTIR, XPS, SIMS, and NMR techniques. The molecular structure of the precursor was established by a single-crystal X-ray diffraction experiment. Crystallographic data (-165 degrees C): triclinic space group P1, a = 9.402(3) Angstrom, b = 11.068(3) Angstrom, c = 7.958(2) Angstrom, alpha = 105.71(2)degrees, beta = 100.99(2)degrees, gamma = 76.27(2)degrees, V = 767.31 Angstrom(3), Z = 2, R = 0.0303, R(w) = 0.0312. In the presence of excess water in the process gas stream, a facile release of free Hhfacac ligand from the copper complex is activated by a proton transfer from coordinated water. Ligand-mediated reduction of the metal from CU2+ to Cu+ and from Cu+ to Cu-0 oxidation states occurs in the absence of an external reducing agent at temperatures of 280 and 400 degrees C, respectively. Evidence for this ligand-mediated reduction is seen in the presence of the two major ligand-oxidation products (CF3COOH and CF3C(OH)(2)CH(OH)(2)) in the effluent from the deposition reaction. A labeling experiment using (H2O)-O-18 proved that oxygen in copper oxide films deposited from Cu(hfacac)(2) onto insulating substrates is derived from water and not the hfacac ligand. As an example of benefits that can be derived from this mechanistic knowledge, we have also shown that replacing H2O with NH3 leads to the formation of Cu3N.

Citovat

PINKAS, Jiří, J. C. HUFFMAN, D. V. BAXTER, M. H. CHISHOLM a K. G. CAULTON. MECHANISTIC ROLE OF H2O AND THE LIGAND IN THE CHEMICAL-VAPOR-DEPOSITION OF CU,CU2O, CUO, AND CU3N FROM BIS(1,1,1,5,5,5-HEXAFLUOROPENTANE-2,4-DIONATO)COPPER(II). Chem. Mater. Washington DC: American Chemical Society, 1995, roč. 7, č. 8, s. 1598-1605. ISSN 0897-4756.

@article{366818,
   author = {Pinkas, Jiří and Huffman, J. C. and Baxter, D. V. and Chisholm, M. H. and Caulton, K. G.},
   article_location = {Washington DC},
   article_number = {8},
   keywords = {DEVICE-QUALITY COPPER; BETA-DIKETONATE COMPLEXES; HELIUM CARRIER GAS; FILM GROWTH;THIN-FILMS; CALCIUM DIPIVALOYLMETHANATES; OXIDE SUPERCONDUCTORS;MOLECULAR-STRUCTURE; HYDROGEN-BONDS; METAL-OXIDES},
   language = {eng},
   issn = {0897-4756},
   journal = {Chem. Mater.},
   title = {MECHANISTIC ROLE OF H2O AND THE LIGAND IN THE CHEMICAL-VAPOR-DEPOSITION OF CU,CU2O, CUO, AND CU3N FROM BIS(1,1,1,5,5,5-HEXAFLUOROPENTANE-2,4-DIONATO)COPPER(II)},
   volume = {7},
   year = {1995}
}

TY  - JOUR
ID  - 366818
AU  - Pinkas, Jiří - Huffman, J. C. - Baxter, D. V. - Chisholm, M. H. - Caulton, K. G.
PY  - 1995
TI  - MECHANISTIC ROLE OF H2O AND THE LIGAND IN THE CHEMICAL-VAPOR-DEPOSITION OF CU,CU2O, CUO, AND CU3N FROM BIS(1,1,1,5,5,5-HEXAFLUOROPENTANE-2,4-DIONATO)COPPER(II)
JF  - Chem. Mater.
VL  - 7
IS  - 8
SP  - 1598
EP  - 1598
PB  - American Chemical Society
SN  - 08974756
KW  - DEVICE-QUALITY COPPER
KW  - BETA-DIKETONATE COMPLEXES
KW  - HELIUM CARRIER GAS
KW  - FILM GROWTH;THIN-FILMS
KW  - CALCIUM DIPIVALOYLMETHANATES
KW  - OXIDE SUPERCONDUCTORS;MOLECULAR-STRUCTURE
KW  - HYDROGEN-BONDS
KW  - METAL-OXIDES
N2  - The mechanism of chemical vapor deposition of Cu, Cu2O, CuO, and Cu3N from Cu(hfacac)(2)(H2O) was studied by XRD, MS, FTIR, XPS, SIMS, and NMR techniques. The molecular structure of the precursor was established by a single-crystal X-ray diffraction experiment. Crystallographic data (-165 degrees C): triclinic space group P1, a = 9.402(3) Angstrom, b = 11.068(3) Angstrom, c = 7.958(2) Angstrom, alpha = 105.71(2)degrees, beta = 100.99(2)degrees, gamma = 76.27(2)degrees, V = 767.31 Angstrom(3), Z = 2, R = 0.0303, R(w) = 0.0312. In the presence of excess water in the process gas stream, a facile release of free Hhfacac ligand from the copper complex is activated by a proton transfer from coordinated water. Ligand-mediated reduction of the metal from CU2+ to Cu+ and from Cu+ to Cu-0 oxidation states occurs in the absence of an external reducing agent at temperatures of 280 and 400 degrees C, respectively. Evidence for this ligand-mediated reduction is seen in the presence of the two major ligand-oxidation products (CF3COOH and CF3C(OH)(2)CH(OH)(2)) in the effluent from the deposition reaction. A labeling experiment using (H2O)-O-18 proved that oxygen in copper oxide films deposited from Cu(hfacac)(2) onto insulating substrates is derived from water and not the hfacac ligand. As an example of benefits that can be derived from this mechanistic knowledge, we have also shown that replacing H2O with NH3 leads to the formation of Cu3N.
ER  -

PINKAS, Jiří, J. C. HUFFMAN, D. V. BAXTER, M. H. CHISHOLM a K. G. CAULTON. MECHANISTIC ROLE OF H2O AND THE LIGAND IN THE CHEMICAL-VAPOR-DEPOSITION OF CU,CU2O, CUO, AND CU3N FROM BIS(1,1,1,5,5,5-HEXAFLUOROPENTANE-2,4-DIONATO)COPPER(II). \textit{Chem. Mater.}. Washington DC: American Chemical Society, 1995, roč.~7, č.~8, s.~1598-1605. ISSN~0897-4756.

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