FRANTA, Daniel, Vilma BURŠÍKOVÁ a Lenka ZAJÍČKOVÁ. Optical characterization of DLC:Si films prepared by PECVD. In Proceedings of 13th Symposium on Application of Plasma Processes. Bratislava (Slovakia): Dept. of Plasma Physics & Inst. of Physics, Comenius University Bratislava (Slovakia), 2001, s. 87-88. ISBN 80-223-157. |
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@inproceedings{374773, author = {Franta, Daniel and Buršíková, Vilma and Zajíčková, Lenka}, address = {Bratislava (Slovakia)}, booktitle = {Proceedings of 13th Symposium on Application of Plasma Processes}, language = {eng}, location = {Bratislava (Slovakia)}, isbn = {80-223-157}, pages = {87-88}, publisher = {Dept. of Plasma Physics & Inst. of Physics, Comenius University Bratislava (Slovakia)}, title = {Optical characterization of DLC:Si films prepared by PECVD}, url = {http://hydra.physics.muni.cz/~franta/bib/SAPP13_87.html}, year = {2001} }
TY - JOUR ID - 374773 AU - Franta, Daniel - Buršíková, Vilma - Zajíčková, Lenka PY - 2001 TI - Optical characterization of DLC:Si films prepared by PECVD PB - Dept. of Plasma Physics & Inst. of Physics, Comenius University Bratislava (Slovakia) CY - Bratislava (Slovakia) SN - 80223157 UR - http://hydra.physics.muni.cz/~franta/bib/SAPP13_87.html N2 - Multi-sample modification of variable angle of incidence spectroscopic ellipsometry (VASE) was used to characterize silicon doped diamond like carbon (DLC:Si) films prepared by plasma enhanced chemical vapor deposition (PECVD). These films were prepared on wafers of silicon single crystal in the planar capacitively coupled RF reactor. The gas feed for deposition was a mixture of methane (CH4), hexamethyldisiloxane (HMDSO) and argon (Ar). ER -
FRANTA, Daniel, Vilma BURŠÍKOVÁ a Lenka ZAJÍČKOVÁ. Optical characterization of DLC:Si films prepared by PECVD. In \textit{Proceedings of 13th Symposium on Application of Plasma Processes}. Bratislava (Slovakia): Dept. of Plasma Physics \&{} Inst. of Physics, Comenius University Bratislava (Slovakia), 2001, s.~87-88. ISBN~80-223-157.
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