| SONNENFELD, Axel, T. M. TUN, Lenka ZAJÍČKOVÁ, K. V. KOZLOV, H.-E. WAGNER, J. F. BEHNKE a R. HIPPLER. Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison. Plasmas and Polymers. New York: KLUWER ACADEMIC/PLENUM PUBLISHERS, 2001, roč. 6, č. 4, s. 266-295. ISSN 1084-0184. |
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@article{402151,
author = {Sonnenfeld, Axel and Tun, T. M. and Zajíčková, Lenka and Kozlov, K. V. and Wagner, H.andE. and Behnke, J. F. and Hippler, R.},
article_location = {New York},
article_number = {4},
keywords = {DBD},
language = {eng},
issn = {1084-0184},
journal = {Plasmas and Polymers},
title = {Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison},
volume = {6},
year = {2001}
}
TY - JOUR
ID - 402151
AU - Sonnenfeld, Axel - Tun, T. M. - Zajíčková, Lenka - Kozlov, K. V. - Wagner, H.-E. - Behnke, J. F. - Hippler, R.
PY - 2001
TI - Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison
JF - Plasmas and Polymers
VL - 6
IS - 4
SP - 266
EP - 266
PB - KLUWER ACADEMIC/PLENUM PUBLISHERS
SN - 10840184
KW - DBD
N2 - Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison
ER -
SONNENFELD, Axel, T. M. TUN, Lenka ZAJÍČKOVÁ, K. V. KOZLOV, H.-E. WAGNER, J. F. BEHNKE a R. HIPPLER. Deposition Process Based on Organosilicon Precursors in Dielectric Barrier Discharges at Atmospheric Pressure - A Comparison. \textit{Plasmas and Polymers}. New York: KLUWER ACADEMIC/PLENUM PUBLISHERS, 2001, roč.~6, č.~4, s.~266-295. ISSN~1084-0184.
|
