| CHOUKOUROV, A., Y. PIHOSH, V. STELMASHUK, Hynek BIEDERMAN, D. SLAVÍNSKÁ, M. KORMUNDA and Lenka ZAJÍČKOVÁ. Rf sputtering of composite SiOx/plasma polymer films and their basic properties. Surface & coatings technology. Elsevier Science, 2002, vol. 2002, 151-152, p. 214-217. ISSN 0257-8972. |
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@article{402552,
author = {Choukourov, A. and Pihosh, Y. and Stelmashuk, V. and Biederman, Hynek and Slavínská, D. and Kormunda, M. and Zajíčková, Lenka},
article_number = {151-152},
keywords = {Rf magnetron; sputtering; SiOx; plasma polymer films},
language = {eng},
issn = {0257-8972},
journal = {Surface & coatings technology},
title = {Rf sputtering of composite SiOx/plasma polymer films and their basic properties},
volume = {2002},
year = {2002}
}
TY - JOUR
ID - 402552
AU - Choukourov, A. - Pihosh, Y. - Stelmashuk, V. - Biederman, Hynek - Slavínská, D. - Kormunda, M. - Zajíčková, Lenka
PY - 2002
TI - Rf sputtering of composite SiOx/plasma polymer films and their basic properties
JF - Surface & coatings technology
VL - 2002
IS - 151-152
SP - 214
EP - 214
PB - Elsevier Science
SN - 02578972
KW - Rf magnetron
KW - sputtering
KW - SiOx
KW - plasma polymer films
N2 - Rf sputtering of composite SiOx/plasma polymer films and their basic properties
ER -
CHOUKOUROV, A., Y. PIHOSH, V. STELMASHUK, Hynek BIEDERMAN, D. SLAVÍNSKÁ, M. KORMUNDA and Lenka ZAJÍČKOVÁ. Rf sputtering of composite SiOx/plasma polymer films and their basic properties. \textit{Surface \&{} coatings technology}. Elsevier Science, 2002, vol.~2002, 151-152, p.~214-217. ISSN~0257-8972.
|
