| JERGEL, M., C. FALCONY, Petr MIKULÍK, L. ORTEGA, E. MAJKOVÁ, E. PINČÍK, Š. LUBY, I. KOSTIČ a P. HUDEK. X-ray reflectivity study of a W/Si multilayer grating. Superficies y Vacío. Mexico: Sociedad Mexicana de Ciencia de Superfic, 2001, roč. 2001, č. 13, s. 10-14. ISSN 1665-3521. |
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@article{407469,
author = {Jergel, M. and Falcony, C. and Mikulík, Petr and Ortega, L. and Majková, E. and Pinčík, E. and Luby, Š. and Kostič, I. and Hudek, P.},
article_location = {Mexico},
article_number = {13},
keywords = {reflectivity; xrr; x-uv optics; gratings; w/si; x-ray},
language = {eng},
issn = {1665-3521},
journal = {Superficies y Vacío},
title = {X-ray reflectivity study of a W/Si multilayer grating},
url = {http://www.sci.muni.cz/~mikulik/Publications.html#JergelFalconyMikulikOMPLKH-SyV-2001},
volume = {2001},
year = {2001}
}
TY - JOUR
ID - 407469
AU - Jergel, M. - Falcony, C. - Mikulík, Petr - Ortega, L. - Majková, E. - Pinčík, E. - Luby, Š. - Kostič, I. - Hudek, P.
PY - 2001
TI - X-ray reflectivity study of a W/Si multilayer grating
JF - Superficies y Vacío
VL - 2001
IS - 13
SP - 10
EP - 10
PB - Sociedad Mexicana de Ciencia de Superfic
SN - 16653521
KW - reflectivity
KW - xrr
KW - x-uv optics
KW - gratings
KW - w/si
KW - x-ray
UR - http://www.sci.muni.cz/~mikulik/Publications.html#JergelFalconyMikulikOMPLKH-SyV-2001
N2 - Multilayer gratings are artificially patterned multilyer thin films with the periodicities both in the lateral and normal directions which renders them attracting for microelectronic and optical applications. A proper structural characterization is of primary importance. To test the capability of the X-ray reflectometry technique to fulfil this task, a tungsten/silicon multilayer grating prepared by electron beam evaporation and electron beam lithography was studied both in the coplanar and non-coplanar geometries., the nominal lateral and normal periods being 800 nm and 8 nm, respectively. The coplanar measurements were evaluated within the dynamical theory of X-ray scattering on rough gratings and provided the structural parameters of a real structure with a reasonable precision which are close to the nominal ones. The results revealed also some imperfections of the deposition and masking procedures which are discussed. The non-coplanar measurements were evaluated qualitatively using three-dimensional constructions in the reciprocal space. The advantage of the technique used is its non-destructive character and a simultaneous access both to the surface shape of the grating as well as to its internal structure.
ER -
JERGEL, M., C. FALCONY, Petr MIKULÍK, L. ORTEGA, E. MAJKOVÁ, E. PINČÍK, Š. LUBY, I. KOSTIČ a P. HUDEK. X-ray reflectivity study of a W/Si multilayer grating. \textit{Superficies y Vacío}. Mexico: Sociedad Mexicana de Ciencia de Superfic, 2001, roč.~2001, č.~13, s.~10-14. ISSN~1665-3521.
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