New Method for the Complete Optical Analysis of Thin Films
Nonuniform in Optical Parameters

J 2003

New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

OHLÍDAL, Miloslav, Ivan OHLÍDAL, Petr KLAPETEK, Miloš JÁKL, Vladimír ČUDEK et. al.

Basic information

Original name

New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters

Authors

OHLÍDAL, Miloslav (203 Czech Republic), Ivan OHLÍDAL (203 Czech Republic, guarantor), Petr KLAPETEK (203 Czech Republic), Miloš JÁKL (203 Czech Republic), Vladimír ČUDEK (203 Czech Republic) and Marek ELIÁŠ (203 Czech Republic)

Edition

Japanese Journal of Applied Physics, Tokyo, Institute of Pure and Applied Physics, 2003, 0021-4922

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10302 Condensed matter physics

Country of publisher

Japan

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 1.171

RIV identification code

RIV/00216224:14310/03:00008288

Organization unit

Faculty of Science

UT WoS

000184780100037

Keywords in English

films nonuniform in optical parameters; optical characterization; CN_x and SiO_y mixture films

Abstract

V originále

In this paper, a new optical method for characterizing thin films exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of the reflectance measured using the special experimental arrangement described in detail. Using this method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin film studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the films studied. The method is illustrated through the optical analysis of strongly nonuniform thin films formed by a mixture of CN_x and SiO_y deposited onto silicon single-crystal substrates.

Links

GA101/01/1104, research and development project

Name: Realizace laboratorního vzoru zařízení pro měření drsnosti povrchu metodou holografické interferometrie

Investor: Czech Science Foundation, Realisation of thelaboratory instrument for surface roughness measurement by holographic interferometry

GA202/01/1110, research and development project

Name: Optické a mechanické vlastnosti tenkých vrstev DLC:Si připravených PECVD metodou

Investor: Czech Science Foundation, Optical and mechanical properties of DLC : Si thin films prepared by the PECVD method

Citovat

OHLÍDAL, Miloslav, Ivan OHLÍDAL, Petr KLAPETEK, Miloš JÁKL, Vladimír ČUDEK and Marek ELIÁŠ. New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters. Japanese Journal of Applied Physics. Tokyo: Institute of Pure and Applied Physics, 2003, vol. 42, 7B, p. 4760-4765, 5 pp. ISSN 0021-4922.

@article{490025,
   author = {Ohlídal, Miloslav and Ohlídal, Ivan and Klapetek, Petr and Jákl, Miloš and Čudek, Vladimír and Eliáš, Marek},
   article_location = {Tokyo},
   article_number = {7B},
   keywords = {films nonuniform in optical parameters; optical characterization; CN_x and SiO_y mixture films},
   language = {eng},
   issn = {0021-4922},
   journal = {Japanese Journal of Applied Physics},
   title = {New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters},
   volume = {42},
   year = {2003}
}

TY  - JOUR
ID  - 490025
AU  - Ohlídal, Miloslav - Ohlídal, Ivan - Klapetek, Petr - Jákl, Miloš - Čudek, Vladimír - Eliáš, Marek
PY  - 2003
TI  - New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters
JF  - Japanese Journal of Applied Physics
VL  - 42
IS  - 7B
SP  - 4760-4765
EP  - 4760-4765
PB  - Institute of Pure and Applied Physics
SN  - 00214922
KW  - films nonuniform in optical parameters
KW  - optical characterization
KW  - CN_x and SiO_y mixture films
N2  - In this paper, a new optical method for characterizing thin films exhibiting area nonuniformity in optical parameters is described. This method is based on interpreting the spectral dependences of the reflectance measured using the special experimental arrangement described in detail. Using this method, the distribution of both the optical parameters, i.e. the local thickness and local refractive index, describing the thin film studied can be determined along a large area of the substrate. It is shown that the method presented can be employed for determining strong nonuniformities in the optical parameters of the films studied. The method is illustrated through the optical analysis of strongly nonuniform thin films formed by a mixture of CN_x and SiO_y deposited onto silicon single-crystal substrates.
ER  -

OHLÍDAL, Miloslav, Ivan OHLÍDAL, Petr KLAPETEK, Miloš JÁKL, Vladimír ČUDEK and Marek ELIÁŠ. New Method for the Complete Optical Analysis of Thin Films Nonuniform in Optical Parameters. \textit{Japanese Journal of Applied Physics}. Tokyo: Institute of Pure and Applied Physics, 2003, vol.~42, 7B, p.~4760-4765, 5 pp. ISSN~0021-4922.

Detailed Information on Publication Record