MEŠKO, Marcel, Petr VAŠINA, Vít KUDRLE, Zdeněk FRGALA and Jan JANČA. Electron density measurements in pulsed microwave discharge in nitrogen gas. In Proceedings of contributed papers WDS'03. Praha: MFF UK, 2003, p. 315-319.
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Basic information
Original name Electron density measurements in pulsed microwave discharge in nitrogen gas
Authors MEŠKO, Marcel (703 Slovakia, guarantor), Petr VAŠINA (203 Czech Republic), Vít KUDRLE (203 Czech Republic), Zdeněk FRGALA (203 Czech Republic) and Jan JANČA (203 Czech Republic).
Edition Praha, Proceedings of contributed papers WDS'03, p. 315-319, 5 pp. 2003.
Publisher MFF UK
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher Czech Republic
Confidentiality degree is not subject to a state or trade secret
RIV identification code RIV/00216224:14310/03:00008474
Organization unit Faculty of Science
Keywords in English electron density; microwave interferometer; high power; pulse
Tags electron density, high power, microwave interferometer, pulse
Tags International impact
Changed by Changed by: prof. Mgr. Vít Kudrle, Ph.D., učo 2560. Changed: 5/1/2007 12:49.
Abstract
Electron density measurements in pulsed microwave discharge in nitrogen gas
Links
GP202/01/P106, research and development projectName: Studium plazmochemických procesů pomocí mikrovlnné a optické spektroskopie
Investor: Czech Science Foundation, Study of plasmachemical processes using microwave and optical spectroscopy
MSM 143100003, plan (intention)Name: Studium plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study of plasmachemical reactions in non-isothermic low pressure plasma and its interaction with the surface of solid substrates
OC 527.20, research and development projectName: Plazmochemické depozice a plazmochemické opracování povrchu pevných substrátů
Investor: Ministry of Education, Youth and Sports of the CR, Plasmachemical depositions and plasmachemical treatment of surfaces of solid state substrate
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