Detailed Information on Publication Record
2004
Deposition of polymer films by rf discharge at atmospheric pressure
SLAVÍČEK, Pavel, Vilma BURŠÍKOVÁ, Antonín BRABLEC, Vratislav KAPIČKA, Miloš KLÍMA et. al.Basic information
Original name
Deposition of polymer films by rf discharge at atmospheric pressure
Name in Czech
Depozice polymerních vrstev v rf výboji za atmosférického tlaku
Authors
SLAVÍČEK, Pavel (203 Czech Republic, guarantor), Vilma BURŠÍKOVÁ (203 Czech Republic), Antonín BRABLEC (203 Czech Republic), Vratislav KAPIČKA (203 Czech Republic) and Miloš KLÍMA (203 Czech Republic)
Edition
Czech. J. Phys. Praha, Institute of Physics Academy of Sciences, 2004, 0011-4626
Other information
Language
English
Type of outcome
Článek v odborném periodiku
Field of Study
10305 Fluids and plasma physics
Country of publisher
Czech Republic
Confidentiality degree
není předmětem státního či obchodního tajemství
Impact factor
Impact factor: 0.292
RIV identification code
RIV/00216224:14310/04:00019762
Organization unit
Faculty of Science
UT WoS
000226745500016
Keywords in English
deposition of films; rf discharge; plasma diagnostics
Tags
International impact, Reviewed
Změněno: 8/2/2008 19:43, doc. RNDr. Vilma Buršíková, Ph.D.
V originále
RF plasma nozzle at atmospheric pressure has been used for deposition of thin films. The mechanical properties of deposited films were studied using indentation technique. Special properties of RF discharges offer hopeful technological applications like deposition of thin solid films. The parameters of the plasma were investigated by spectral and optical methods. The powered RF electrode of the torch discharge plasma source is made from the metal or dielectric pipe with an inner diameter of 1 - 2 mm and with a length of several centimeters. The electrode is connected through the matching unit to the RF generator driven at the frequency of 13.56 MHz. The mixture of argon and n-hexane or HMDSO (hexamethyldisiloxane, C6H18Si2O) gas ows through the RF electrode at the pipe. Polymer films were deposited on the several substrates e.g. glass, brass polished plates and Si wafers.
In Czech
Depozice polymerních vrstev v rf výboji za atmosférického tlaku
Links
| GA202/03/0011, research and development project |
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| MSM 143100003, plan (intention) |
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| OC 527.20, research and development project |
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