| ČECHAL, Jan, Petr TICHOPÁDEK, Alois NEBOJSA, Olga BONAVENTUROVÁ ZRZAVECKÁ, Michal URBÁNEK, Jiří SPOUSTA, Karel NAVRÁTIL and Tomáš ŠIKOLA. In situ analysis of PMPSi by spectroscopic ellipsometry and XPS. Surface and Interface Analysis. USA: John Wiley & Sons, 2004, vol. 2004, No 36, p. 1218-1221. ISSN 0142-2421. |
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@article{559741,
author = {Čechal, Jan and Tichopádek, Petr and Nebojsa, Alois and Bonaventurová Zrzavecká, Olga and Urbánek, Michal and Spousta, Jiří and Navrátil, Karel and Šikola, Tomáš},
article_location = {USA},
article_number = {36},
keywords = {spectroscopic ellipsometry; x-ray photoelectron spectroscopy; XPS; polysilanes; PMPSi},
language = {eng},
issn = {0142-2421},
journal = {Surface and Interface Analysis},
title = {In situ analysis of PMPSi by spectroscopic ellipsometry and XPS},
volume = {2004},
year = {2004}
}
TY - JOUR
ID - 559741
AU - Čechal, Jan - Tichopádek, Petr - Nebojsa, Alois - Bonaventurová Zrzavecká, Olga - Urbánek, Michal - Spousta, Jiří - Navrátil, Karel - Šikola, Tomáš
PY - 2004
TI - In situ analysis of PMPSi by spectroscopic ellipsometry and XPS
JF - Surface and Interface Analysis
VL - 2004
IS - 36
SP - 1218-1221
EP - 1218-1221
PB - John Wiley & Sons
SN - 01422421
KW - spectroscopic ellipsometry
KW - x-ray photoelectron spectroscopy
KW - XPS
KW - polysilanes
KW - PMPSi
N2 - In-situ monitoring of the UV-light and thermal treatment of PMPSi thin films by real-time spectroscopic ellipsometry and XPS is reported. The films were treated both under ultrahigh vacuum and oxygen atmosphere. The results of this study indicate that the Si-Si bonds in the polymer main chain were primarily broken at the UV-light treatment. However, the Si radicals recombined into the polymer-like chains causing no remarkable chemical shift. The UV-light treatment under enhanced sample temperature (~80C) in oxygen atmosphere resulted in the more intense degradation of the PMPSi film. This can be related to cutting off the volatile methyl groups from the polymer main chains.
ER -
ČECHAL, Jan, Petr TICHOPÁDEK, Alois NEBOJSA, Olga BONAVENTUROVÁ ZRZAVECKÁ, Michal URBÁNEK, Jiří SPOUSTA, Karel NAVRÁTIL and Tomáš ŠIKOLA. In situ analysis of PMPSi by spectroscopic ellipsometry and XPS. \textit{Surface and Interface Analysis}. USA: John Wiley \&{} Sons, 2004, vol.~2004, No~36, p.~1218-1221. ISSN~0142-2421.
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