FRANTA, Daniel, Ivan OHLÍDAL, Petr KLAPETEK a Miloslav OHLÍDAL. Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy. Surface and Interface Analysis. USA: John Wiley & Sons., 2004, roč. 36, č. 8, s. 1203-1206. ISSN 0142-2421. |
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@article{562878, author = {Franta, Daniel and Ohlídal, Ivan and Klapetek, Petr and Ohlídal, Miloslav}, article_location = {USA}, article_number = {8}, keywords = {THERMAL-OXIDATION; ROUGH BOUNDARIES; LAYERS}, language = {eng}, issn = {0142-2421}, journal = {Surface and Interface Analysis}, title = {Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy}, url = {http://hydra.physics.muni.cz/~franta/bib/SIA36_1203.html}, volume = {36}, year = {2004} }
TY - JOUR ID - 562878 AU - Franta, Daniel - Ohlídal, Ivan - Klapetek, Petr - Ohlídal, Miloslav PY - 2004 TI - Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy JF - Surface and Interface Analysis VL - 36 IS - 8 SP - 1203-1206 EP - 1203-1206 PB - John Wiley & Sons. SN - 01422421 KW - THERMAL-OXIDATION KW - ROUGH BOUNDARIES KW - LAYERS UR - http://hydra.physics.muni.cz/~franta/bib/SIA36_1203.html N2 - In this paper the results of optical and atomic force microscopy characterization of oxide thin films prepared by thermal oxidation of GaAs single crystal wafers at a temperature of 500degreesC in air are presented. The optical characterization is performed using multi-sample modification of the method based on combining variable angle spectroscopic ellipsometry and near-normal spectroscopic reflectometry. It is shown that the films exhibit the rough lower boundaries and refractive index profile inhomogeneities. The spectral dependences of the refractive index and extinction coefficient of these films are presented within the wide spectral region, i.e., 210-900 nm. The values of the thicknesses and roughness parameters characterizing the oxide films are introduced as well. ER -
FRANTA, Daniel, Ivan OHLÍDAL, Petr KLAPETEK a Miloslav OHLÍDAL. Characterization of thin oxide films on GaAs substrates by optical methods and atomic force microscopy. \textit{Surface and Interface Analysis}. USA: John Wiley \&{} Sons., 2004, roč.~36, č.~8, s.~1203-1206. ISSN~0142-2421.
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