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@inproceedings{565019, author = {Franclová, Jana and Kučerová, Zuzana and Buršíková, Vilma}, address = {Bratislava}, booktitle = {15th Symposium on Aplications of Plasma Processes}, keywords = {thin films; electrical properties}, language = {eng}, location = {Bratislava}, isbn = {80-223-2018-8}, pages = {161-162}, publisher = {Comenius University Press}, title = {Electrical Properties of SiOxHyCz Coatings Prepared by PECVD}, year = {2005} }
TY - JOUR ID - 565019 AU - Franclová, Jana - Kučerová, Zuzana - Buršíková, Vilma PY - 2005 TI - Electrical Properties of SiOxHyCz Coatings Prepared by PECVD PB - Comenius University Press CY - Bratislava SN - 8022320188 KW - thin films KW - electrical properties N2 - It is well known that MIM structures exhibit various high-field processes, which may be either electrode-limited (e.g. tunneling, Schottky-barrier emission) or bulk-limited (e.g. space-charge-limited conduction, Poole-Frenkel conduction) [1]. Thin films prepared using PECVD exhibited Pool-Frenkel conductivity at lower voltages and tunnelling at higher voltages. This behaviour was indicated by a linear dependence of lnI on U1/2 or lnI on 1/U, where I is the current and U is the applied voltage. ER -
FRANCLOVÁ, Jana, Zuzana KUČEROVÁ a Vilma BURŠÍKOVÁ. Electrical Properties of SiOxHyCz Coatings Prepared by PECVD. In \textit{15th Symposium on Aplications of Plasma Processes}. Bratislava: Comenius University Press, 2005, s.~161-162. ISBN~80-223-2018-8.
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