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@inproceedings{565019,
author = {Franclová, Jana and Kučerová, Zuzana and Buršíková, Vilma},
address = {Bratislava},
booktitle = {15th Symposium on Aplications of Plasma Processes},
keywords = {thin films; electrical properties},
language = {eng},
location = {Bratislava},
isbn = {80-223-2018-8},
pages = {161-162},
publisher = {Comenius University Press},
title = {Electrical Properties of SiOxHyCz Coatings Prepared by PECVD},
year = {2005}
}
TY - JOUR
ID - 565019
AU - Franclová, Jana - Kučerová, Zuzana - Buršíková, Vilma
PY - 2005
TI - Electrical Properties of SiOxHyCz Coatings Prepared by PECVD
PB - Comenius University Press
CY - Bratislava
SN - 8022320188
KW - thin films
KW - electrical properties
N2 - It is well known that MIM structures exhibit various high-field processes, which may be either electrode-limited (e.g. tunneling, Schottky-barrier emission) or bulk-limited (e.g. space-charge-limited conduction, Poole-Frenkel conduction) [1]. Thin films prepared using PECVD exhibited Pool-Frenkel conductivity at lower voltages and tunnelling at higher voltages. This behaviour was indicated by a linear dependence of lnI on U1/2 or lnI on 1/U, where I is the current and U is the applied voltage.
ER -
FRANCLOVÁ, Jana, Zuzana KUČEROVÁ a Vilma BURŠÍKOVÁ. Electrical Properties of SiOxHyCz Coatings Prepared by PECVD. In \textit{15th Symposium on Aplications of Plasma Processes}. Bratislava: Comenius University Press, 2005, s.~161-162. ISBN~80-223-2018-8.
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