Influence of the pulse duration of fast high power magnetron
discharge on the amount of ion collected on the substrate

D 2005

Influence of the pulse duration of fast high power magnetron discharge on the amount of ion collected on the substrate

VAŠINA, Petr, Martina MRÁZKOVÁ, Marcel MEŠKO, Jean-Christophe IMBERT, Mihai GANCIU et. al.

Základní údaje

Originální název

Influence of the pulse duration of fast high power magnetron discharge on the amount of ion collected on the substrate

Název česky

Vliv delky pulzu pulzniho magnetronu na mnozstvi iontu na substratu

Autoři

VAŠINA, Petr (203 Česká republika, garant), Martina MRÁZKOVÁ (203 Česká republika), Marcel MEŠKO (703 Slovensko), Jean-Christophe IMBERT (250 Francie), Mihai GANCIU (642 Rumunsko), Caroline BOISSE-LAPORTE (250 Francie), Ludovic DE POUCQUES (250 Francie), Michel TOUZEAU (250 Francie), Daniel PAGNON (250 Francie) a Jean BRETAGNE (250 Francie)

Vydání

Eidhoven, Proceeding of 27th International Conference on Phenomena in Ionised Gases, od s. 1-4, 4 s. 2005

Nakladatel

Eidhoven University of Technology

Další údaje

Jazyk

angličtina

Typ výsledku

Stať ve sborníku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Nizozemské království

Utajení

není předmětem státního či obchodního tajemství

Kód RIV

RIV/00216224:14310/05:00012897

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

magnetron sputtering; plasma diagnostics; pulsed discharge

Štítky

magnetron sputtering, plasma diagnostics, pulsed discharge

Změněno: 23. 2. 2006 15:00, prof. Mgr. Petr Vašina, Ph.D.

Anotace

ORIG CZ

V originále

In this paper, we report the influence of the various stages of the preionized high power pulsed magnetron discharge on the saturated ion substrate holder current. A home made system allows superposition of low preionisation current with high voltage pulses. The preionisation establishes a low density plasma near the magnetron cathode before applying each high power pulse. The pulse duration was varied from 1.5 ľs up to 8 ľs by 0.5 ľs step. It allows us to obtain the influence of each 0.5 ľs phase of magnetron pulse on the substrate holder current. The repetition frequency (5 Hz) is chosen very low to avoid the coupling between two successive pulses. For Ar pressure of ~ 1 Pa, voltage ~ 1 kV applied on a cathode, the maximum current of ~ 40 A is reached in 6 ľs. For a 33 mm copper target, the high power sputtering by argon ions passes very quickly to the stable self-sputtering regime through a short time transient regime. In the first regime, the total amount of ions arriving to the substrate varies nonlinearly with the total amount of the ions bombarding the cathode during one pulse. However, in self-sputtering regime, linear dependence is reached.

Česky

Studium magnetronového výboje rovinnou Langmuirovou sondou.

Návaznosti

GD202/03/H162, projekt VaV

Název: Pokročilé směry ve fyzice a chemii plazmatu

Investor: Grantová agentura ČR, Pokročilé směry ve fyzice a chemii plazmatu

MSM0021622411, záměr

Název: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Citovat

VAŠINA, Petr, Martina MRÁZKOVÁ, Marcel MEŠKO, Jean-Christophe IMBERT, Mihai GANCIU, Caroline BOISSE-LAPORTE, Ludovic DE POUCQUES, Michel TOUZEAU, Daniel PAGNON a Jean BRETAGNE. Influence of the pulse duration of fast high power magnetron discharge on the amount of ion collected on the substrate. In Proceeding of 27th International Conference on Phenomena in Ionised Gases. Eidhoven: Eidhoven University of Technology, 2005, s. 1-4.

@inproceedings{596444,
   author = {Vašina, Petr and Mrázková, Martina and Meško, Marcel and Imbert, JeanandChristophe and Ganciu, Mihai and BoisseandLaporte, Caroline and de Poucques, Ludovic and Touzeau, Michel and Pagnon, Daniel and Bretagne, Jean},
   address = {Eidhoven},
   booktitle = {Proceeding of 27th International Conference on Phenomena in Ionised Gases},
   keywords = {magnetron sputtering; plasma diagnostics; pulsed discharge},
   language = {eng},
   location = {Eidhoven},
   pages = {1-4},
   publisher = {Eidhoven University of Technology},
   title = {Influence of the pulse duration of fast high power magnetron discharge on the amount of ion collected on the substrate},
   year = {2005}
}

TY  - JOUR
ID  - 596444
AU  - Vašina, Petr - Mrázková, Martina - Meško, Marcel - Imbert, Jean-Christophe - Ganciu, Mihai - Boisse-Laporte, Caroline - de Poucques, Ludovic - Touzeau, Michel - Pagnon, Daniel - Bretagne, Jean
PY  - 2005
TI  - Influence of the pulse duration of fast high power magnetron discharge on the amount of ion collected on the substrate
PB  - Eidhoven University of Technology
CY  - Eidhoven
KW  - magnetron sputtering
KW  - plasma diagnostics
KW  - pulsed discharge
N2  - In this paper, we report the influence of the various stages of the preionized high power pulsed magnetron discharge on the saturated ion substrate holder current. A home made system allows superposition of low preionisation current with high voltage pulses. The preionisation establishes a low density plasma near the magnetron cathode before applying each high power pulse. The pulse duration was varied from 1.5 ľs up to 8 ľs by 0.5 ľs step. It allows us to obtain the influence of each 0.5 ľs phase of magnetron pulse on the substrate holder current. The repetition frequency (5 Hz) is chosen very low to avoid the coupling between two successive pulses. For Ar pressure of ~ 1 Pa, voltage ~ 1 kV applied on a cathode, the maximum current of ~ 40 A is reached in 6 ľs. For a 33 mm copper target, the high power sputtering by argon ions passes very quickly to the stable self-sputtering regime through a short time transient regime. In the first regime, the total amount of ions arriving to the substrate varies nonlinearly with the total amount of the ions bombarding the cathode during one pulse. However, in self-sputtering regime, linear dependence is reached.
ER  -

VAŠINA, Petr, Martina MRÁZKOVÁ, Marcel MEŠKO, Jean-Christophe IMBERT, Mihai GANCIU, Caroline BOISSE-LAPORTE, Ludovic DE POUCQUES, Michel TOUZEAU, Daniel PAGNON a Jean BRETAGNE. Influence of the pulse duration of fast high power magnetron discharge on the amount of ion collected on the substrate. In \textit{Proceeding of 27th International Conference on Phenomena in Ionised Gases}. Eidhoven: Eidhoven University of Technology, 2005, s.~1-4.

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