J 2006

A dip in the chlorophyll fluorescence induction at 0.22 s in Trebouxia-possessing lichens reflects a fast reoxidation of photosystem I. A comparison with higher plants

ILÍK, Petr, Gert SCHANSKER, Eva KOTABOVÁ, Peter VÁCZI, Reto J. STRASSER et. al.

Basic information

Original name

A dip in the chlorophyll fluorescence induction at 0.22 s in Trebouxia-possessing lichens reflects a fast reoxidation of photosystem I. A comparison with higher plants

Name in Czech

Pokles chl....

Authors

ILÍK, Petr (203 Czech Republic, guarantor), Gert SCHANSKER (756 Switzerland), Eva KOTABOVÁ (203 Czech Republic), Peter VÁCZI (703 Slovakia), Reto J. STRASSER (756 Switzerland) and Miloš BARTÁK (203 Czech Republic)

Edition

Biochimica et Biophysica Acta Bioenergetics, Amsterdam, Elsevier, 2006, 0005-2728

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10610 Biophysics

Country of publisher

Netherlands

Confidentiality degree

není předmětem státního či obchodního tajemství

Impact factor

Impact factor: 4.237

RIV identification code

RIV/00216224:14310/06:00015578

Organization unit

Faculty of Science

UT WoS

000235094200002

Keywords in English

Chlorophyll fluorescence; OJIP-transient; Lichen; 820-nm transmission; Photobiont; Photosystem; Thylakoid membrane; Trebouxia; Lasallia pustulata; Umbilicaria hirsuta; Hypogymnia physodes
Změněno: 25/1/2006 12:56, Mgr. Peter Váczi, Ph.D.

Abstract

V originále

An unusual dip (compared to higher plant behaviour under comparable light conditions) in chlorophyll fluorescence induction (FI) at about 0.22 s was observed for thalli of several lichen species having Trebouxia species (the most common symbiotic green algae) as their native photobionts and for Trebouxia species cultured separately in nutrient solution. This dip appears after the usual O(J)IP transient at a wide range of excitation light intensities (1001800 mol photons m 2 s 1). Simultaneous measurements of FI and 820-nm transmission kinetics (I820) with lichen thalli showed that the decreasing part of the fluorescence dip (0.20.4 s) is accompanied by a decrease of I820, i.e., by a reoxidation of electron carriers at photosystem I (PSI), while the subsequent increasing part (0.42 s) of the dip is not paralleled by the change in I820. These results were compared with that measured with pea leaves representatives of higher plants. In pea, PSI started to reoxidize after 2-s excitation. The simultaneous measurements performed with thalli treated with methylviologen (MV), an efficient electron acceptor from PSI, revealed that the narrow P peak in FI of Trebouxia-possessing lichens (i.e., the IP-dip phase) gradually disappeared with prolonged MV treatment. Thus, the P peak behaves in a similar way as in higher plants where it reflects a traffic jam of electrons induced by a transient block at the acceptor side of PSI. The increasing part of the dip in FI remained unaffected by the addition of MV. We have found that the fluorescence dip is insensitive to antimycin A, rotenone (inhibitors of cyclic electron flow around PSI), and propyl gallate (an inhibitor of plastid terminal oxidase). The 2-h treatment with 5 M nigericin, an ionophore effectively dissipating the pH-gradient across the thylakoid membrane, did not lead to significant changes either in FI nor I820 kinetics. On the basis of the presented results, we suggest that the decreasing part of the fluorescence dip in FI of Trebouxia-lichens reflects the activation of ferredoxinNADP+oxidoreductase or Mehlerperoxidase reaction leading to the fast reoxidation of electron carriers in thylakoid membranes. The increasing part of the dip probably reflects a transient reduction of plastoquinone (PQ) pool that is not associated with cyclic electron flow around PSI. Possible causes of this MV-insensitive PQ reduction are discussed.

In Czech

Nezvyklý pokles...

Links

GA522/03/0754, research and development project
Name: Fotoinhibice a fotoochrana u lišejníků v extrémních podmínkách
Investor: Czech Science Foundation, Photoinhibition and photoprotection in lichens under extreme conditions
MSM6198959215, plan (intention)
Name: Variabilita složek a interakcí v rostlinném patosystému a vliv faktorů prostředí na jejich projev