Thermoionic vacuum arc (TVA) deposited tungsten thin film
characterization

J 2006

Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization

VLADOIU, R., V. CIUPINA, C.P. LUNGU, Vilma BURŠÍKOVÁ, G. MUSA et. al.

Základní údaje

Originální název

Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization

Název česky

Charakterizace wolframových tenkých vrstev deponovaných termoionický vakuovým obloukem (TVA)

Autoři

VLADOIU, R. (642 Rumunsko), V. CIUPINA (642 Rumunsko), C.P. LUNGU (642 Rumunsko), Vilma BURŠÍKOVÁ (203 Česká republika, garant) a G. MUSA (642 Rumunsko)

Vydání

Journal of Optoelectronics and Advanced Materials, Bucharest, INOE & INFM, 2006, 1454-4164

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Rumunsko

Utajení

není předmětem státního či obchodního tajemství

Impakt faktor

Impact factor: 1.106

Kód RIV

RIV/00216224:14310/06:00016723

Organizační jednotka

Přírodovědecká fakulta

UT WoS

000236107300015

Klíčová slova anglicky

Thermoionic vacuum arc (TVA); tungsten; thin film; characterization

Štítky

Characterization, Thermoionic vacuum arc (TVA), thin film, tungsten

Příznaky

Recenzováno

Změněno: 5. 1. 2007 12:37, doc. RNDr. Vilma Buršíková, Ph.D.

Anotace

ORIG CZ

V originále

In this paper, we present the characterization of the tungsten thin films deposited by Thermo-ionic Vacuum Arc (TVA) method. Characterization of the obtained tungsten thin films has been made by Transmission Electron Microscope (TEM) with a magnification of 1.4 M and a resolution of 1.4 angstrom. Other techniques were used as Grain Size Distribution, Selected Area Diffraction (SAED), Fast Fourier Transmission (FFT). The obtained films were characterized by nano-indentation and atomic force microscopy (AFM). The AFM measurements have proved the smoothness of the deposited films (however with some droplets) with peak to valley roughness in the range of 20-30 nm. As regards tribological results, the hardness of deposited films was measured by a Karl Zeiss microhardner tester and the coefficient of friction was measured with an Amsler tribometer. The samples (graphite substrates 30 mm x 30 mm x 8 mm coated with W) were tested using depth sensing indentation tester Fischerscope H100 Xyp. We can report that the tungsten film had significantly higher resistance against indentation.

Česky

Charakterizace wolframových tenkých vrstev deponovaných termoionický vakuovým obloukem (TVA)

Návaznosti

MSM0021622411, záměr

Název: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Citovat

VLADOIU, R., V. CIUPINA, C.P. LUNGU, Vilma BURŠÍKOVÁ a G. MUSA. Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization. Journal of Optoelectronics and Advanced Materials. Bucharest: INOE & INFM, 2006, roč. 8, č. 1, s. 71-73. ISSN 1454-4164.

@article{632684,
   author = {Vladoiu, R. and Ciupina, V. and Lungu, C.P. and Buršíková, Vilma and Musa, G.},
   article_location = {Bucharest},
   article_number = {1},
   keywords = {Thermoionic vacuum arc (TVA); tungsten; thin film; characterization},
   language = {eng},
   issn = {1454-4164},
   journal = {Journal of Optoelectronics and Advanced Materials},
   title = {Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization},
   volume = {8},
   year = {2006}
}

TY  - JOUR
ID  - 632684
AU  - Vladoiu, R. - Ciupina, V. - Lungu, C.P. - Buršíková, Vilma - Musa, G.
PY  - 2006
TI  - Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization
JF  - Journal of Optoelectronics and Advanced Materials
VL  - 8
IS  - 1
SP  - 71
EP  - 71
PB  - INOE & INFM
SN  - 14544164
KW  - Thermoionic vacuum arc (TVA)
KW  - tungsten
KW  - thin film
KW  - characterization
N2  - In this paper, we present the characterization of the tungsten thin films deposited by Thermo-ionic Vacuum Arc (TVA) method. Characterization of the obtained tungsten thin films has been made by Transmission Electron Microscope (TEM) with a magnification of 1.4 M and a resolution of 1.4 angstrom. Other techniques were used as Grain Size Distribution, Selected Area Diffraction (SAED), Fast Fourier Transmission (FFT). The obtained films were characterized by nano-indentation and atomic force microscopy (AFM). The AFM measurements have proved the smoothness of the deposited films (however with some droplets) with peak to valley roughness in the range of 20-30 nm. As regards tribological results, the hardness of deposited films was measured by a Karl Zeiss microhardner tester and the coefficient of friction was measured with an Amsler tribometer. The samples (graphite substrates 30 mm x 30 mm x 8 mm coated with W) were tested using depth sensing indentation tester Fischerscope H100 Xyp. We can report that the tungsten film had significantly higher resistance against indentation.
ER  -

VLADOIU, R., V. CIUPINA, C.P. LUNGU, Vilma BURŠÍKOVÁ a G. MUSA. Thermoionic vacuum arc (TVA) deposited tungsten thin film characterization. \textit{Journal of Optoelectronics and Advanced Materials}. Bucharest: INOE \&{} INFM, 2006, roč.~8, č.~1, s.~71-73. ISSN~1454-4164.

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