Influence of Silicon, Oxygen and Nitrogen Upon the Properties
of Plasma Deposited Amorphous Diamond-like Carbon Coatings

J 2006

Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings

BURŠÍKOVÁ, Vilma, Lenka ZAJÍČKOVÁ, Pavel DVOŘÁK, Miroslav VALTR, Jiří BURŠÍK et. al.

Základní údaje

Originální název

Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings

Název česky

Vliv příměsí křemíku, kyslíku a dusíku na vlastnosti amorfních diamantu podobných uhlíkových vrstev deponovaných v plazmatu

Autoři

BURŠÍKOVÁ, Vilma (203 Česká republika, garant), Lenka ZAJÍČKOVÁ (203 Česká republika), Pavel DVOŘÁK (203 Česká republika), Miroslav VALTR (203 Česká republika), Jiří BURŠÍK (203 Česká republika), Olga BLÁHOVÁ (203 Česká republika), Vratislav PEŘINA (203 Česká republika) a Jan JANČA (203 Česká republika)

Vydání

Journal of advanced oxidation technologies, Dundas, Ontario, Canada, Science & Technology Network, Inc. 2006, 1203-8407

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Kanada

Utajení

není předmětem státního či obchodního tajemství

Impakt faktor

Impact factor: 0.850

Kód RIV

RIV/00216224:14310/06:00017368

Organizační jednotka

Přírodovědecká fakulta

UT WoS

000239478600023

Klíčová slova anglicky

Silicon; Oxygen; Nitrogen; Admixtures; PECVD; Amorphous Diamond-like Carbon Coatings

Štítky

Admixtures, Amorphous Diamond-like Carbon Coatings, Nitrogen, Oxygen, PECVD, Silicon

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 4. 7. 2009 17:59, Mgr. Miroslav Valtr, Ph.D.

Anotace

V originále

Amorphous diamond-like carbon films (DLC) with various silicon, oxygen and nitrogen content were deposited by plasma enhanced chemical vapor deposition (PECVD) technique. The films were prepared from the mixture of methane and hexamethyldisiloxane (HMDSO) in r.f. capacitively coupled discharges (13.56 MHz). The reactive plasma was investigated by optical emission spectroscopy and capacitive coupled planar probe. A combination of RBS, ERDA, FTIR and XPS methods was used to study the films' chemical composition and structure. The mechanical properties were studied using a depth sensing indentation technique. The films were mainly composed of C-C, C-H and C-Si bonds. The optimum deposition conditions for the preparation of DLC films, with enhanced thermo-mechanical stability, were determined.

Návaznosti

MSM0021622411, záměr

Název: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Citovat

BURŠÍKOVÁ, Vilma, Lenka ZAJÍČKOVÁ, Pavel DVOŘÁK, Miroslav VALTR, Jiří BURŠÍK, Olga BLÁHOVÁ, Vratislav PEŘINA a Jan JANČA. Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings. Journal of advanced oxidation technologies. Dundas, Ontario, Canada: Science & Technology Network, Inc., 2006, roč. 9, č. 2, s. 232-237, 5 s. ISSN 1203-8407.

@article{699203,
   author = {Buršíková, Vilma and Zajíčková, Lenka and Dvořák, Pavel and Valtr, Miroslav and Buršík, Jiří and Bláhová, Olga and Peřina, Vratislav and Janča, Jan},
   article_location = {Dundas, Ontario, Canada},
   article_number = {2},
   keywords = {Silicon; Oxygen; Nitrogen; Admixtures; PECVD; Amorphous Diamond-like Carbon Coatings},
   language = {eng},
   issn = {1203-8407},
   journal = {Journal of advanced oxidation technologies},
   title = {Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings},
   volume = {9},
   year = {2006}
}

TY  - JOUR
ID  - 699203
AU  - Buršíková, Vilma - Zajíčková, Lenka - Dvořák, Pavel - Valtr, Miroslav - Buršík, Jiří - Bláhová, Olga - Peřina, Vratislav - Janča, Jan
PY  - 2006
TI  - Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings
JF  - Journal of advanced oxidation technologies
VL  - 9
IS  - 2
SP  - 232-237
EP  - 232-237
PB  - Science & Technology Network, Inc.
SN  - 12038407
KW  - Silicon
KW  - Oxygen
KW  - Nitrogen
KW  - Admixtures
KW  - PECVD
KW  - Amorphous Diamond-like Carbon Coatings
N2  - Amorphous diamond-like carbon films (DLC) with various silicon, oxygen and nitrogen content were deposited by plasma enhanced chemical vapor deposition (PECVD) technique. The films were prepared from the mixture of methane and hexamethyldisiloxane (HMDSO) in r.f. capacitively coupled discharges (13.56 MHz). The reactive plasma was investigated by optical emission spectroscopy and capacitive coupled planar probe. A combination of RBS, ERDA, FTIR and XPS methods was used to study the films' chemical composition and structure. The mechanical properties were studied using a depth sensing indentation technique. The films were mainly composed of C-C, C-H and C-Si bonds. The optimum deposition conditions for the preparation of DLC films, with enhanced thermo-mechanical stability, were determined.
ER  -

BURŠÍKOVÁ, Vilma, Lenka ZAJÍČKOVÁ, Pavel DVOŘÁK, Miroslav VALTR, Jiří BURŠÍK, Olga BLÁHOVÁ, Vratislav PEŘINA a Jan JANČA. Influence of Silicon, Oxygen and Nitrogen Upon the Properties of Plasma Deposited Amorphous Diamond-like Carbon Coatings. \textit{Journal of advanced oxidation technologies}. Dundas, Ontario, Canada: Science \&{} Technology Network, Inc., 2006, roč.~9, č.~2, s.~232-237, 5 s. ISSN~1203-8407.

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