Comparison of structure and mechanical properties of SiO2-like
films deposited in O2/HMDSO pulsed and continuous plasmas

J 2006

Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas

BOSQUET, Angelique, Vilma BURŠÍKOVÁ, A. GOULLET, A. DJOUADI, Lenka ZAJÍČKOVÁ et. al.

Základní údaje

Originální název

Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas

Název česky

Srovnání struktury SiO2-podobných vrstev deponovaných v pulzním a kontinuálním O2/HMDSO plazmatu

Autoři

BOSQUET, Angelique (250 Francie), Vilma BURŠÍKOVÁ (203 Česká republika, garant), A. GOULLET (250 Francie), A. DJOUADI (250 Francie), Lenka ZAJÍČKOVÁ (203 Česká republika) a Agnes GRANIER (250 Francie)

Vydání

Surface & coatings technology, Elsevier Science, 2006, 0257-8972

Další údaje

Jazyk

angličtina

Typ výsledku

Článek v odborném periodiku

Obor

10305 Fluids and plasma physics

Stát vydavatele

Nizozemské království

Utajení

není předmětem státního či obchodního tajemství

Impakt faktor

Impact factor: 1.559

Kód RIV

RIV/00216224:14310/06:00017371

Organizační jednotka

Přírodovědecká fakulta

UT WoS

000237842300069

Klíčová slova anglicky

SILICON DIOXIDE; COATINGS

Štítky

coatings, SILICON DIOXIDE

Příznaky

Mezinárodní význam, Recenzováno

Změněno: 17. 7. 2007 17:57, doc. Mgr. Lenka Zajíčková, Ph.D.

Anotace

ORIG CZ

V originále

In many applications (ophthalmic lenses, car headlights, etc.), silicon oxide films are used as protective coatings in order to improve the mechanical properties of polymers. The Plasma Enhanced Chemical Vapor Deposition (PECVD), which allows deposition of dense films at temperature near the ambient, is particularly relevant for this. In this work, SiO2-like films have been deposited in a helicon reactor operated in inductive mode at low pressure with pulsed O-2/HMDSO plasmas. The influence of the plasma-off time on the structure and mechanical properties of deposited films are studied and compared to those of the film deposited with a continuously applied power. Ellipsometric measurements and infrared spectra show that all the films are SiO2-like films, transparent from 1.5 to 5 eV and possess a refractive index (n = 1.46 at 1.95 eV) close to the thermal oxide one. Good mechanical properties are observed from the depth sensing indentations by Fischerscope tester. The plastic hardness is found to decrease from 15.5 to 13.5 GPa when the plasma-off time increases, whereas the elastic modulus is the same (78 GPa). In continuous mode, the hardness value obtained is higher than the fused silica one (10 GPa) which is explained by a high compressive stress of 185 MPa, as determined from Newton's ring method. Plasma pulsing allows to reduce the compressive stress to 40 MPa. On the AFM micrographs, one can observe a buckling around the indentation print due to this compressive stress in films. The interfacial fracture toughness has been estimated from the radius of the delaminated area and linked to previous stress measurements. Moreover, all the films present a good resistance to delamination. (c) 2005 Elsevier B.V. All rights reserved.

Česky

Srovnání struktury SiO2-podobných vrstev deponovaných v pulzním a kontinuálním O2/HMDSO plazmatu

Návaznosti

MSM0021622411, záměr

Název: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministerstvo školství, mládeže a tělovýchovy ČR, Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Citovat

BOSQUET, Angelique, Vilma BURŠÍKOVÁ, A. GOULLET, A. DJOUADI, Lenka ZAJÍČKOVÁ a Agnes GRANIER. Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas. Surface & coatings technology. Elsevier Science, 2006, roč. 200, 22-23, s. 6517-6521, 4 s. ISSN 0257-8972.

@article{699213,
   author = {Bosquet, Angelique and Buršíková, Vilma and Goullet, A. and Djouadi, A. and Zajíčková, Lenka and Granier, Agnes},
   article_number = {22-23},
   keywords = {SILICON DIOXIDE; COATINGS},
   language = {eng},
   issn = {0257-8972},
   journal = {Surface & coatings technology},
   title = {Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas},
   volume = {200},
   year = {2006}
}

TY  - JOUR
ID  - 699213
AU  - Bosquet, Angelique - Buršíková, Vilma - Goullet, A. - Djouadi, A. - Zajíčková, Lenka - Granier, Agnes
PY  - 2006
TI  - Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas
JF  - Surface & coatings technology
VL  - 200
IS  - 22-23
SP  - 6517-6521
EP  - 6517-6521
PB  - Elsevier Science
SN  - 02578972
KW  - SILICON DIOXIDE
KW  - COATINGS
N2  - In many applications (ophthalmic lenses, car headlights, etc.), silicon oxide films are used as protective coatings in order to improve the mechanical properties of polymers. The Plasma Enhanced Chemical Vapor Deposition (PECVD), which allows deposition of dense films at temperature near the ambient, is particularly relevant for this. In this work, SiO2-like films have been deposited in a helicon reactor operated in inductive mode at low pressure with pulsed O-2/HMDSO plasmas. The influence of the plasma-off time on the structure and mechanical properties of deposited films are studied and compared to those of the film deposited with a continuously applied power. Ellipsometric measurements and infrared spectra show that all the films are SiO2-like films, transparent from 1.5 to 5 eV and possess a refractive index (n = 1.46 at 1.95 eV) close to the thermal oxide one. Good mechanical properties are observed from the depth sensing indentations by Fischerscope tester. The plastic hardness is found to decrease from 15.5 to 13.5 GPa when the plasma-off time increases, whereas the elastic modulus is the same (78 GPa). In continuous mode, the hardness value obtained is higher than the fused silica one (10 GPa) which is explained by a high compressive stress of 185 MPa, as determined from Newton's ring method. Plasma pulsing allows to reduce the compressive stress to 40 MPa. On the AFM micrographs, one can observe a buckling around the indentation print due to this compressive stress in films. The interfacial fracture toughness has been estimated from the radius of the delaminated area and linked to previous stress measurements. Moreover, all the films present a good resistance to delamination. (c) 2005 Elsevier B.V. All rights reserved.
ER  -

BOSQUET, Angelique, Vilma BURŠÍKOVÁ, A. GOULLET, A. DJOUADI, Lenka ZAJÍČKOVÁ a Agnes GRANIER. Comparison of structure and mechanical properties of SiO2-like films deposited in O2/HMDSO pulsed and continuous plasmas. \textit{Surface \&{} coatings technology}. Elsevier Science, 2006, roč.~200, 22-23, s.~6517-6521, 4 s. ISSN~0257-8972.

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