| ZAJÍČKOVÁ, Lenka, Vilma BURŠÍKOVÁ, Zuzana KUČEROVÁ, Daniel FRANTA, Pavel DVOŘÁK, Radek ŠMÍD, Vratislav PEŘINA a Anna MACKOVÁ. Deposition of protective coatings in rf organosilicon discharges. Plasma Sources Science and Technology. Bristol: Institute of Physics Publishing, 2007, roč. 16, č. 1, s. S123-S132, 10 s. ISSN 0963-0252. |
Další formáty:
BibTeX
LaTeX
RIS
@article{720366,
author = {Zajíčková, Lenka and Buršíková, Vilma and Kučerová, Zuzana and Franta, Daniel and Dvořák, Pavel and Šmíd, Radek and Peřina, Vratislav and Macková, Anna},
article_location = {Bristol},
article_number = {1},
keywords = {CARBON-FILMS; GLOW-DISCHARGES; PLASMA; PECVD; POLYCARBONATE; SUBSTRATE},
language = {eng},
issn = {0963-0252},
journal = {Plasma Sources Science and Technology},
title = {Deposition of protective coatings in rf organosilicon discharges},
volume = {16},
year = {2007}
}
TY - JOUR
ID - 720366
AU - Zajíčková, Lenka - Buršíková, Vilma - Kučerová, Zuzana - Franta, Daniel - Dvořák, Pavel - Šmíd, Radek - Peřina, Vratislav - Macková, Anna
PY - 2007
TI - Deposition of protective coatings in rf organosilicon discharges
JF - Plasma Sources Science and Technology
VL - 16
IS - 1
SP - S123-S132
EP - S123-S132
PB - Institute of Physics Publishing
SN - 09630252
KW - CARBON-FILMS
KW - GLOW-DISCHARGES
KW - PLASMA
KW - PECVD
KW - POLYCARBONATE
KW - SUBSTRATE
N2 - The paper discusses the deposition of protective coatings ranging from organosilicon plasma polymers to SiO2-like films and hard diamond-like carbon/silicon oxide (DLC : SiOx) coatings in radio frequency capacitively coupled discharges using hexamethyldisiloxane (HMDSO). As a result of the optimization of the deposition conditions it was possible to obtain high performance protective coatings. In the HMDSO/O-2 mixture, it was shown that rather than the SiO2-like film a hard cross-linked SiOx C-y H-z polymer film can be used as a protective coating for polycarbonate. The optimum conditions for the deposition of an almost stress-free film were 17% of HMDSO and dc bias voltage of -240V. The film hardness and elastic modulus were 10GPa and 75GPa, respectively. The refractive index at 600 nm was 1.5 and the extinction coefficient decreased from 0.02 at 240 nm down to zero at 600 nm. The films deposited from HMDSO/CH4 and HMDSO/CH4/H-2 mixtures exhibited the attractive properties of DLC films with the partial elimination of some of their drawbacks, such as absorption in the visible and a high intrinsic stress. The optimum concentration of the HMDSO was approximately 21%. Under these conditions the concentration of SiOx in the films was approximately 9 at.%. The film hardness and elastic modulus were above 22 GPa and 120 GPa, respectively.
ER -
ZAJÍČKOVÁ, Lenka, Vilma BURŠÍKOVÁ, Zuzana KUČEROVÁ, Daniel FRANTA, Pavel DVOŘÁK, Radek ŠMÍD, Vratislav PEŘINA a Anna MACKOVÁ. Deposition of protective coatings in rf organosilicon discharges. \textit{Plasma Sources Science and Technology}. Bristol: Institute of Physics Publishing, 2007, roč.~16, č.~1, s.~S123-S132, 10 s. ISSN~0963-0252.
|
