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@inproceedings{722572,
author = {Valtr, Miroslav and Klapetek, Petr and Ohlídal, Ivan and Duchoň, Václav},
address = {Prague},
booktitle = {Proceedings of ICPIG XXVIII Conference},
keywords = {Carbon; Oxidation; Optical Properties},
language = {eng},
location = {Prague},
isbn = {978-80-87026-01-4},
pages = {761-764},
publisher = {Institute of Plasma Physics AS CR},
title = {Study of thickness reduction of a-C:H thin film under UV light irradiation},
year = {2007}
}
TY - JOUR
ID - 722572
AU - Valtr, Miroslav - Klapetek, Petr - Ohlídal, Ivan - Duchoň, Václav
PY - 2007
TI - Study of thickness reduction of a-C:H thin film under UV light irradiation
PB - Institute of Plasma Physics AS CR
CY - Prague
SN - 9788087026014
KW - Carbon
KW - Oxidation
KW - Optical Properties
N2 - In this paper we present a study of thickness reduction of an amorphous hydrocarbon (a-C:H) thin film under UV light irradiation. Optical parameters of the film are examined by means of spectroscopic ellipsometry and area reflectance measurement. We observed a linear dependence in thickness reduction. The reduction velocity is 10.1 nm/h in this region. However, if the thickness of the film was less then approx. 14 nm, the reduction velocity decreases subsequently. Area reflectance measurement consisting in taking reflectance spectra in many points lying along the area of the sample is used to create a map with thickness distribution along this area. This method is very sensitive to small thickness variations.
ER -
VALTR, Miroslav, Petr KLAPETEK, Ivan OHLÍDAL and Václav DUCHOŇ. Study of thickness reduction of a-C:H thin film under UV light irradiation. In \textit{Proceedings of ICPIG XXVIII Conference}. Prague: Institute of Plasma Physics AS CR, 2007, p.~761-764. ISBN~978-80-87026-01-4.
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