| BRZOBOHATÝ, Oto, Vilma BURŠÍKOVÁ, David NEČAS, Miroslav VALTR and David TRUNEC. Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation. Journal of Physics D: Applied Physics. Bristol, England: IOP Publishing Ltd., 2008, vol. 41, No 035213, p. 1-8. ISSN 0022-3727. |
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@article{767517,
author = {Brzobohatý, Oto and Buršíková, Vilma and Nečas, David and Valtr, Miroslav and Trunec, David},
article_location = {Bristol, England},
article_number = {035213},
keywords = {r.f. plasma; computer simulation; secondary electron emision; plasma deposition; plasma sputtering},
language = {eng},
issn = {0022-3727},
journal = {Journal of Physics D: Applied Physics},
title = {Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation},
volume = {41},
year = {2008}
}
TY - JOUR
ID - 767517
AU - Brzobohatý, Oto - Buršíková, Vilma - Nečas, David - Valtr, Miroslav - Trunec, David
PY - 2008
TI - Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation
JF - Journal of Physics D: Applied Physics
VL - 41
IS - 035213
SP - 1-8
EP - 1-8
PB - IOP Publishing Ltd.
SN - 00223727
KW - r.f. plasma
KW - computer simulation
KW - secondary electron emision
KW - plasma deposition
KW - plasma sputtering
N2 - The aim of the present work was to investigate the influence of the substrate material on the plasma enhanced chemical vapor deposition and the plasma sputtering of thin films in low pressure parallel-plate r.f. discharges. It was observed that the deposition or sputtering rates differed above different materials, e.g., above a substrate and substrate electrode. Moreover, the substrates placed on the bottom r.f. electrode seemed to be mirrored in the thickness of a thin film deposited or sputtered on the upper grounded electrode. The influence of the substrate material on the plasma parameters was studied via Particle In Cell/Monte Carlo computer simulation. According to our finding the mirroring of the substrate was caused by different secondary electron emission yields of the substrate material and material of the substrate electrode.
ER -
BRZOBOHATÝ, Oto, Vilma BURŠÍKOVÁ, David NEČAS, Miroslav VALTR and David TRUNEC. Influence of substrate material on plasma indeposition/sputtering reactor: experiment and computer simulation. \textit{Journal of Physics D: Applied Physics}. Bristol, England: IOP Publishing Ltd., 2008, vol.~41, No~035213, p.~1-8. ISSN~0022-3727.
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