| MARŠÍK, Přemysl, Patrick VERDONCK, Dieter SCHNEIDER, David DE ROEST, Shinya KANEKO a Mikhail BAKLANOV. Spectroscopic elipsometry and ellipsometric porosimetry studies of CVD low-k dielectric films. physica status solidi (c). Weinheim: WILEY-VCH Verlag GmbH, 2008, roč. 5, č. 5, s. 1253-1256. ISSN 1610-1634. |
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@article{768409,
author = {Maršík, Přemysl and Verdonck, Patrick and Schneider, Dieter and De Roest, David and Kaneko, Shinya and Baklanov, Mikhail},
article_location = {Weinheim},
article_number = {5},
keywords = {low-k dielectrics; ellipsometry; porosimetry},
language = {eng},
issn = {1610-1634},
journal = {physica status solidi (c)},
title = {Spectroscopic elipsometry and ellipsometric porosimetry studies of CVD low-k dielectric films},
volume = {5},
year = {2008}
}
TY - JOUR
ID - 768409
AU - Maršík, Přemysl - Verdonck, Patrick - Schneider, Dieter - De Roest, David - Kaneko, Shinya - Baklanov, Mikhail
PY - 2008
TI - Spectroscopic elipsometry and ellipsometric porosimetry studies of CVD low-k dielectric films
JF - physica status solidi (c)
VL - 5
IS - 5
SP - 1253-1256
EP - 1253-1256
PB - WILEY-VCH Verlag GmbH
SN - 16101634
KW - low-k dielectrics
KW - ellipsometry
KW - porosimetry
N2 - Aurora ELK, a porous low-k SiCOH film deposited by CVD, was used to study the effect of UV curing. Samples were cured for various curing times and the purpose of this work is to observe the effects of UV curing on optical, mechanical and structural properties of the low-k film. We have used 1) ellipsometric porosimetry to determine the porosity and the pore-size distribution and 2) nitrogen purged UV ellipsometry in a range from 2 to 9 eV to observe the changes of the di-electric function of the cured material. Additional FTIR and laser-induced surface acoustic wave measurements were performed. The porogen removal and the increase of porosity were observed, and a k-value of 2.3 was reached for the optimum curing time. However for longer curing times, densification and reduction of the porosity occurs. The growth of the hydrogen incorporation has been observed.
ER -
MARŠÍK, Přemysl, Patrick VERDONCK, Dieter SCHNEIDER, David DE ROEST, Shinya KANEKO a Mikhail BAKLANOV. Spectroscopic elipsometry and ellipsometric porosimetry studies of CVD low-k dielectric films. \textit{physica status solidi (c)}. Weinheim: WILEY-VCH Verlag GmbH, 2008, roč.~5, č.~5, s.~1253-1256. ISSN~1610-1634.
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