| ESLAVA, Salvador, Guillaume EYMERY, Přemysl MARŠÍK, Francesca IACOPI, Christine KIRSCHHOCK, Karen MAEX, Johan MARTENS a Mikhail BAKLANOV. Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing. Journal of the electrochemical society. New York: The Electrochemical Society, 2008, roč. 155, č. 5, s. G115-G120, 6 s. ISSN 0013-4651. |
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@article{768425,
author = {Eslava, Salvador and Eymery, Guillaume and Maršík, Přemysl and Iacopi, Francesca and Kirschhock, Christine and Maex, Karen and Martens, Johan and Baklanov, Mikhail},
article_location = {New York},
article_number = {5},
keywords = {low-k; ellipsometry; UV-cure},
language = {eng},
issn = {0013-4651},
journal = {Journal of the electrochemical society},
title = {Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing},
volume = {155},
year = {2008}
}
TY - JOUR
ID - 768425
AU - Eslava, Salvador - Eymery, Guillaume - Maršík, Přemysl - Iacopi, Francesca - Kirschhock, Christine - Maex, Karen - Martens, Johan - Baklanov, Mikhail
PY - 2008
TI - Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing
JF - Journal of the electrochemical society
VL - 155
IS - 5
SP - G115-G120
EP - G115-G120
PB - The Electrochemical Society
SN - 00134651
KW - low-k
KW - ellipsometry
KW - UV-cure
N2 - Ultraviolet-assisted curing (UV curing) has been recently applied to enhance the mechanical properties of low-k films. Knowledge about which ultraviolet energies are most effective is still limited and the consequences of applying the UV-curing process to integrated stacks in on-chip interconnects unknown. To clarify these open questions we investigated the optical properties of a SiCOH low-k layer by purged ultraviolet spectroscopic ellipsometry in the energy region 2-9 eV. The complex refractive index of the low-k film shows an absorption edge with a superimposed absorption band at 6.4 eV that vanishes upon ultraviolet-assisted curing. Comparison with Fourier transform infrared transmission demonstrates that the absorption at 6.4 eV must be attributed to the organic porogens, which have also influences on the absorption edge.
ER -
ESLAVA, Salvador, Guillaume EYMERY, Přemysl MARŠÍK, Francesca IACOPI, Christine KIRSCHHOCK, Karen MAEX, Johan MARTENS a Mikhail BAKLANOV. Optical Property Changes in Low-k Films upon Ultraviolet-Assisted Curing. \textit{Journal of the electrochemical society}. New York: The Electrochemical Society, 2008, roč.~155, č.~5, s.~G115-G120, 6 s. ISSN~0013-4651.
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