PRAGER, Lutz, Přemysl MARŠÍK, J. W. GERLACH, Mikhail BAKLANOV, S. NAUMOV, L. PISTOL, Dieter SCHNEIDER, L. WENNRICH, Patrick VERDONCK a M.R. BUCHMEISER. Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths. Microelectronic Engineering. Elsevier B.V., 2008, roč. 85, č. 10, s. 2094-2097. ISSN 0167-9317. |
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@article{768426, author = {Prager, Lutz and Maršík, Přemysl and Gerlach, J. W. and Baklanov, Mikhail and Naumov, S. and Pistol, L. and Schneider, Dieter and Wennrich, L. and Verdonck, Patrick and Buchmeiser, M.R.}, article_number = {10}, keywords = {low-k; UV curing}, language = {eng}, issn = {0167-9317}, journal = {Microelectronic Engineering}, title = {Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths}, volume = {85}, year = {2008} }
TY - JOUR ID - 768426 AU - Prager, Lutz - Maršík, Přemysl - Gerlach, J. W. - Baklanov, Mikhail - Naumov, S. - Pistol, L. - Schneider, Dieter - Wennrich, L. - Verdonck, Patrick - Buchmeiser, M.R. PY - 2008 TI - Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths JF - Microelectronic Engineering VL - 85 IS - 10 SP - 2094-2097 EP - 2094-2097 PB - Elsevier B.V. SN - 01679317 KW - low-k KW - UV curing N2 - Low-k dielectrics prepared by CVD in the form of 200 nm thick layers on Si wafers were thermally treated at 410 C and irradiated using UV lamps emitting photons of different wavelengths around 172 nm, 185 nm, and 222 nm. The treatment was performed in high vacuum and under a nitrogen atmosphere at various pressures ranging from 0.1 mbar up to 700 mbar. Subsequently, the samples were investigated using FTIR transmission spectroscopy, contact angle measurement, X-ray photoelectron spectrometry (XPS), time-of-flight secondary ion mass spectrometry (TOF-SIMS), X-ray reflectometry (XRR), surface acoustic wave spectrometry (SAW), and purged UV spectroscopic ellipsometry (PUVSE). ER -
PRAGER, Lutz, Přemysl MARŠÍK, J. W. GERLACH, Mikhail BAKLANOV, S. NAUMOV, L. PISTOL, Dieter SCHNEIDER, L. WENNRICH, Patrick VERDONCK a M.R. BUCHMEISER. Effect of pressure on efficiency of UV curing of CVD-derived low-k material at different wavelengths. \textit{Microelectronic Engineering}. Elsevier B.V., 2008, roč.~85, č.~10, s.~2094-2097. ISSN~0167-9317.
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