ORAVA, Jiří, Tomáš WAGNER, Miloš KRBAL, Tomáš KOHOUTEK, Milan VLČEK, Ludvík BENEŠ, Eva KOTULANOVÁ, Petr BEZDIČKA, Petr KLAPETEK a Miloslav FRUMAR. Selective wet etching of amorphous/crystallized Ag/As/S and Ag/As/S/Se chalcogenide thin films. Journal of Physics and Chemistry of Solids. Elsevier, 2007, roč. 68, 5-6, s. 1008-1013. ISSN 0022-3697. |
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@article{769953, author = {Orava, Jiří and Wagner, Tomáš and Krbal, Miloš and Kohoutek, Tomáš and Vlček, Milan and Beneš, Ludvík and Kotulanová, Eva and Bezdička, Petr and Klapetek, Petr and Frumar, Miloslav}, article_number = {5-6}, keywords = {Chalcogenides;Amorphous materials;Quasicrystals;Thin films;Surface properties}, language = {eng}, issn = {0022-3697}, journal = {Journal of Physics and Chemistry of Solids}, title = {Selective wet etching of amorphous/crystallized Ag/As/S and Ag/As/S/Se chalcogenide thin films}, volume = {68}, year = {2007} }
TY - JOUR ID - 769953 AU - Orava, Jiří - Wagner, Tomáš - Krbal, Miloš - Kohoutek, Tomáš - Vlček, Milan - Beneš, Ludvík - Kotulanová, Eva - Bezdička, Petr - Klapetek, Petr - Frumar, Miloslav PY - 2007 TI - Selective wet etching of amorphous/crystallized Ag/As/S and Ag/As/S/Se chalcogenide thin films JF - Journal of Physics and Chemistry of Solids VL - 68 IS - 5-6 SP - 1008-1013 EP - 1008-1013 PB - Elsevier SN - 00223697 KW - Chalcogenides;Amorphous materials;Quasicrystals;Thin films;Surface properties N2 - The paper is focused on the possibilities of selective wet etching of optically and thermally crystallized /amorphous Ag-doped chalcogenide thin films, namely Ag-x(As0.33S0.67)(100-x) and Ag-x(As0.33S0.335Se0.335)(100-x). The selective etching of optically(thermally) crystallized Ag-x(As0.33S0.67)(100-x) and thermally crystallized Ag-x(As0.33S0.335Se0.335)(100-x) thin films in water solution of NaCN is presented. The good surface quality is an important and crucial parameter for optical elements fabrication (e.g. grids, waveguides, etc.) especially in nanometer dimensions. The selective etching of undoped and Ag optically doped region was also carried out to observe surface roughness of doped region before and after selective etching. Characterization of the structure and surface of studied films by Raman spectroscopy, X-ray diffraction, AFM and SEM methods has been done and potential application suggested. ER -
ORAVA, Jiří, Tomáš WAGNER, Miloš KRBAL, Tomáš KOHOUTEK, Milan VLČEK, Ludvík BENEŠ, Eva KOTULANOVÁ, Petr BEZDIČKA, Petr KLAPETEK a Miloslav FRUMAR. Selective wet etching of amorphous/crystallized Ag/As/S and Ag/As/S/Se chalcogenide thin films. \textit{Journal of Physics and Chemistry of Solids}. Elsevier, 2007, roč.~68, 5-6, s.~1008-1013. ISSN~0022-3697.
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