2007
Electromagnetic field distribution modelling in microlenses fabrication process
KLAPETEK, Petr; Tomáš WAGNER and Jiří ORAVABasic information
Original name
Electromagnetic field distribution modelling in microlenses fabrication process
Name in Czech
Modelování rozložení elektromagnetického pole při procesu výroby mikročoček
Authors
KLAPETEK, Petr (203 Czech Republic, guarantor); Tomáš WAGNER (203 Czech Republic) and Jiří ORAVA (203 Czech Republic)
Edition
Journal of Physics and Chemistry of Solids, Elsevier, 2007, 0022-3697
Other information
Language
English
Type of outcome
Article in a journal
Field of Study
10302 Condensed matter physics
Country of publisher
Czech Republic
Confidentiality degree
is not subject to a state or trade secret
Impact factor
Impact factor: 0.899
RIV identification code
RIV/00216224:14310/07:00030102
Organization unit
Faculty of Science
UT WoS
000247887800043
Keywords in English
Chalcogenides;Microstructure
Tags
Tags
International impact, Reviewed
Changed: 19/6/2008 11:24, Mgr. Miroslav Valtr, Ph.D.
Abstract
In the original language
In this article, theoretical modelling of electromagnetic field distribution in the exposed thin film during lithographic process of microlenses array formation is presented. While studying topography of microlenses by means of atomic force microscopy we have found that various diffraction effects are observed due to the small dimensions of microlens patterns comparing to the wavelength. In this article we use finite-difference in time domain (FDTD) method to model electromagnetic field distribution in complex pattern-film geometry. Within FDTD, we solve Maxwell equations numerically, which enables us to model any type of geometry or material properties. Therefore, the effects of different perturbations, like pattern boundary imperfections or thin film roughness can be studied within this method, showing their effect on the electromagnetic field distribution within illuminated chalcogenide thin film.
Links
FT-TA3/142, research and development project |
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