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@article{769965,
author = {Zemek, Josef and Olejník, Kamil and Klapetek, Petr},
article_location = {Amsterdam},
article_number = {7},
keywords = {X-ray photoelectron spectroscopy; Surface roughness; Random surface roughness; AFM; Monte Carlo calculation; Overlayer thickness estimation},
language = {eng},
issn = {0039-6028},
journal = {Surface science},
title = {Photoelectron spectroscopy from randomly corrugated surfaces},
volume = {602},
year = {2008}
}
TY - JOUR
ID - 769965
AU - Zemek, Josef - Olejník, Kamil - Klapetek, Petr
PY - 2008
TI - Photoelectron spectroscopy from randomly corrugated surfaces
JF - Surface science
VL - 602
IS - 7
SP - 1440-1446
EP - 1440-1446
PB - Elsevier
SN - 00396028
KW - X-ray photoelectron spectroscopy
KW - Surface roughness
KW - Random surface roughness
KW - AFM
KW - Monte Carlo calculation
KW - Overlayer thickness estimation
N2 - The influence of random surface roughness on photoelectron intensities has been investigated by angular-resolved photoelectron spectroscopy and advanced calculations. Randomly corrugated silicon surfaces covered by a native silicon oxide, characterized by atomic force microscopy (AFM), were considered in calculations including the shadowing of photoelectrons and the differences between microscopic and macroscopic electron emission geometry. It is shown that the photoelectron intensity is mainly influenced by the spread of a local area distribution of slopes. The error induced by the random surface corrugation can be, however, acceptably low for the spread lesser than 35 degrees.
ER -
ZEMEK, Josef, Kamil OLEJNÍK a Petr KLAPETEK. Photoelectron spectroscopy from randomly corrugated surfaces. \textit{Surface science}. Amsterdam: Elsevier, 2008, roč.~602, č.~7, s.~1440-1446. ISSN~0039-6028.
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