| NEČAS, David, Vratislav PEŘINA, Daniel FRANTA, Ivan OHLÍDAL and Josef ZEMEK. Optical characterization of non-stoichiometric silicon nitride films. physica status solidi (c). Weinheim: WILEY-VCH Verlag GmbH, 2008, vol. 5, No 5, p. 1320-1323. ISSN 1610-1634. |
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@article{775835,
author = {Nečas, David and Peřina, Vratislav and Franta, Daniel and Ohlídal, Ivan and Zemek, Josef},
article_location = {Weinheim},
article_number = {5},
keywords = {ellipsometry; spectrophotometry; silicon nitride; stoichiometry; optical constants},
language = {eng},
issn = {1610-1634},
journal = {physica status solidi (c)},
title = {Optical characterization of non-stoichiometric silicon nitride films},
volume = {5},
year = {2008}
}
TY - JOUR
ID - 775835
AU - Nečas, David - Peřina, Vratislav - Franta, Daniel - Ohlídal, Ivan - Zemek, Josef
PY - 2008
TI - Optical characterization of non-stoichiometric silicon nitride films
JF - physica status solidi (c)
VL - 5
IS - 5
SP - 1320-1323
EP - 1320-1323
PB - WILEY-VCH Verlag GmbH
SN - 16101634
KW - ellipsometry
KW - spectrophotometry
KW - silicon nitride
KW - stoichiometry
KW - optical constants
N2 - Characterizations of non-stoichiometric silicon nitride films prepared by PECVD method onto silicon single crystal substrates are performed using variable angle spectroscopic ellipsometry and spectroscopic reflectometry and Rutherford backscattering spectrometry (RBS). The optical characterization employs a dispersion model based on the parameterization of the density of electronic states of the valence and conduction bands. The thin overlayers onto the upper boundaries of the films are taken into account. The values of the dispersion parameters of the SiNx films and thicknesses of these films and overlayers are determined. The ratios of Si and N atomic fractions in the individual films are evaluated using RBS. The results from the optical method and RBS are correlated.
ER -
NEČAS, David, Vratislav PEŘINA, Daniel FRANTA, Ivan OHLÍDAL and Josef ZEMEK. Optical characterization of non-stoichiometric silicon nitride films. \textit{physica status solidi (c)}. Weinheim: WILEY-VCH Verlag GmbH, 2008, vol.~5, No~5, p.~1320-1323. ISSN~1610-1634.
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