2008
Relationship between the nanoindentation response of amorphous carbon thin films and the depth profile of their structure
STOICA, Adrian, Vilma BURŠÍKOVÁ, Anca NICULESCU, Rodica VLADOIU, Jiří BURŠÍK et. al.Základní údaje
Originální název
Relationship between the nanoindentation response of amorphous carbon thin films and the depth profile of their structure
Název česky
Relationship between the nanoindentation response of amorphous carbon thin films and the depth profile of their structure
Autoři
STOICA, Adrian, Vilma BURŠÍKOVÁ, Anca NICULESCU, Rodica VLADOIU, Jiří BURŠÍK, Petr KLAPETEK a Olga BLAHOVA
Vydání
Constanta, Romania, International Balkan Workshop on Applied Physics - Book of abstracts, od s. 111-111, 1 s. 2008
Nakladatel
Ovidius University Press
Další údaje
Jazyk
angličtina
Typ výsledku
Stať ve sborníku
Obor
10305 Fluids and plasma physics
Stát vydavatele
Rumunsko
Utajení
není předmětem státního či obchodního tajemství
Organizační jednotka
Přírodovědecká fakulta
ISBN
978-973-614-415-8
Příznaky
Mezinárodní význam
Změněno: 12. 9. 2008 12:28, Mgr. Adrian Stoica, Ph.D.
V originále
The aim of this work is to characterize the amorphous carbon thin films by nanoindentation and to compare the properties of such films deposited using techniques like low pressure radio frequency plasma enhanced chemical vapor deposition (PECVD) and thermionic vacuum arc (TVA). The depositions were made on steel and single crystalline silicon substrates. We focused our attention on the following coating properties: hardness, elastic modulus, fracture toughness, film-substrate adhesion. The purpose of this work is to obtain information regarding the film structure depth profile only from the nanoindentation testing response. The mechanical tests were performed using continuous stiffness measurement (CSM) by Nanoindenter XP, depth sensing indentation by Fisherscope H100 tester, and dynamic mechanical analysis (DMA) by ultra nano hardness tester (UNHT). Moreover, we studied the effect of the internal stress on the indentation response of the film-substrate systems. The morphology of the film surface before and after indentation tests was examined using scanning electron and atomic force microscopy (SEM, AFM) and by optical microscope in Nomarski contrast and in polarized light.
Česky
The aim of this work is to characterize the amorphous carbon thin films by nanoindentation and to compare the properties of such films deposited using techniques like low pressure radio frequency plasma enhanced chemical vapor deposition (PECVD) and thermionic vacuum arc (TVA). The depositions were made on steel and single crystalline silicon substrates. We focused our attention on the following coating properties: hardness, elastic modulus, fracture toughness, film-substrate adhesion. The purpose of this work is to obtain information regarding the film structure depth profile only from the nanoindentation testing response. The mechanical tests were performed using continuous stiffness measurement (CSM) by Nanoindenter XP, depth sensing indentation by Fisherscope H100 tester, and dynamic mechanical analysis (DMA) by ultra nano hardness tester (UNHT). Moreover, we studied the effect of the internal stress on the indentation response of the film-substrate systems. The morphology of the film surface before and after indentation tests was examined using scanning electron and atomic force microscopy (SEM, AFM) and by optical microscope in Nomarski contrast and in polarized light.
Návaznosti
| GA202/07/1669, projekt VaV |
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