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@inproceedings{791596, author = {Trunec, David and Šíra, Martin and Sťahel, Pavel and Buršíková, Vilma}, address = {Francie}, booktitle = {Proccedings of HAKONE X}, keywords = {electrical discharge; atmospheric pressure; nitrogen}, language = {eng}, location = {Francie}, pages = {1-5}, publisher = {University of Toulouse}, title = {DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENEOUS DISCHARGE}, year = {2008} }
TY - JOUR ID - 791596 AU - Trunec, David - Šíra, Martin - Sťahel, Pavel - Buršíková, Vilma PY - 2008 TI - DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENEOUS DISCHARGE PB - University of Toulouse CY - Francie KW - electrical discharge KW - atmospheric pressure KW - nitrogen N2 - The atmospheric pressure homogeneous discharge was used for the deposition of thin organosilicon polymer films. The discharge was burning in pure nitrogen used as a carrier gas and a small admixture of hexamethyldisiloxane which was used as a monomer. The temperature of the substrate was elevated up to 120 C to obtain harder thin films. The homogeneity of thin films was enhanced using movable upper electrode. Electrical measurements were used to distinguish between homogeneous and filamentary regime. Mechanical properties of deposited films were characterized by depth sensing indentation technique. The films were polymer-like, transparent in visible range, with uniform thickness and without pinholes. ER -
TRUNEC, David, Martin ŠÍRA, Pavel SŤAHEL a Vilma BURŠÍKOVÁ. DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENEOUS DISCHARGE. In \textit{Proccedings of HAKONE X}. Francie: University of Toulouse, 2008, s.~1-5.
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