TRUNEC, David, Martin ŠÍRA, Pavel SŤAHEL and Vilma BURŠÍKOVÁ. DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENEOUS DISCHARGE. In Proccedings of HAKONE X. Francie: University of Toulouse, 2008, p. 1-5.
Other formats:   BibTeX LaTeX RIS
Basic information
Original name DEPOSITION OF THIN FILMS IN ATMOSPHERIC PRESSURE HOMOGENEOUS DISCHARGE
Name in Czech Depozice tenkých vrstev v homogenním výboji za atmosférického tlaku
Authors TRUNEC, David, Martin ŠÍRA, Pavel SŤAHEL and Vilma BURŠÍKOVÁ.
Edition Francie, Proccedings of HAKONE X, p. 1-5, 5 pp. 2008.
Publisher University of Toulouse
Other information
Original language English
Type of outcome Proceedings paper
Field of Study 10305 Fluids and plasma physics
Country of publisher France
Confidentiality degree is not subject to a state or trade secret
Organization unit Faculty of Science
Keywords in English electrical discharge; atmospheric pressure; nitrogen
Tags atmospheric pressure, electrical discharge, Nitrogen
Tags International impact
Changed by Changed by: doc. Mgr. Pavel Sťahel, Ph.D., učo 6599. Changed: 19/12/2008 08:13.
Abstract
The atmospheric pressure homogeneous discharge was used for the deposition of thin organosilicon polymer films. The discharge was burning in pure nitrogen used as a carrier gas and a small admixture of hexamethyldisiloxane which was used as a monomer. The temperature of the substrate was elevated up to 120 C to obtain harder thin films. The homogeneity of thin films was enhanced using movable upper electrode. Electrical measurements were used to distinguish between homogeneous and filamentary regime. Mechanical properties of deposited films were characterized by depth sensing indentation technique. The films were polymer-like, transparent in visible range, with uniform thickness and without pinholes.
Abstract (in Czech)
The atmospheric pressure homogeneous discharge was used for the deposition of thin organosilicon polymer films. The discharge was burning in pure nitrogen used as a carrier gas and a small admixture of hexamethyldisiloxane which was used as a monomer. The temperature of the substrate was elevated up to 120 C to obtain harder thin films. The homogeneity of thin films was enhanced using movable upper electrode. Electrical measurements were used to distinguish between homogeneous and filamentary regime. Mechanical properties of deposited films were characterized by depth sensing indentation technique. The films were polymer-like, transparent in visible range, with uniform thickness and without pinholes.
Links
GA202/06/1473, research and development projectName: Depozice tenkých vrstev v dielektrických bariérových výbojích za atmosférického tlaku
Investor: Czech Science Foundation, Deposition of thin films in dielectric barrier discharges at atmospheric pressure
PrintDisplayed: 30/5/2024 04:05