Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron ...
| ELIÁŠ, Marek, Pavel SOUČEK and Petr VAŠINA. Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron sputtering. In Book of Extended Abstracts of 2nd Central European Symposium on Plasma Chemistry. Brno: Masaryk University, 2008, p. 105. |
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| Basic information | |
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| Original name | Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron sputtering |
| Name in Czech | Vliv N2 a CH4 na depozicní rychlos borových vrstev připravených magnetronovým naprašováním |
| Authors | ELIÁŠ, Marek (203 Czech Republic), Pavel SOUČEK (203 Czech Republic) and Petr VAŠINA (203 Czech Republic, guarantor). |
| Edition | Brno, Book of Extended Abstracts of 2nd Central European Symposium on Plasma Chemistry, p. 105-105, 2008. |
| Publisher | Masaryk University |
| Other information | |
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| Original language | English |
| Type of outcome | Proceedings paper |
| Field of Study | 10305 Fluids and plasma physics |
| Country of publisher | Czech Republic |
| Confidentiality degree | is not subject to a state or trade secret |
| RIV identification code | RIV/00216224:14310/08:00025120 |
| Organization unit | Faculty of Science |
| Keywords in English | hybrid deposition process; hysteresis |
| Tags | hybrid deposition process, hysteresis |
| Changed by | Changed by: prof. Mgr. Petr Vašina, Ph.D., učo 21782. Changed: 23/12/2008 11:07. |
| Abstract |
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| Influence of N2 and CH4 on deposition rate of boron based thin films prepared by magnetron sputtering, proceeding |
| Abstract (in Czech) |
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| Vliv N2 a CH4 na depozicní rychlos borových vrstev připravených magnetronovým naprašováním, sborník |
| Links | |
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| GP202/08/P038, research and development project | Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev |
| Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition | |
| MSM0021622411, plan (intention) | Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek |
| Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface | |
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