Handbook of Semiconductor Wafer Cleaning Technology: Science,
Technology, and Applications

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Publications Detailed Information on Publication Record

Detailed Information on Publication Record

B 1993

Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology, and Applications

KERN, Werner

Basic information

Original name

Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology, and Applications

Authors

KERN, Werner

Edition

New Jersey, U.S.A. 623 pp. Materials Science and Process Technology Series, 1993

Publisher

Noyes Publications

Other information

Type of outcome

Odborná kniha

Confidentiality degree

není předmětem státního či obchodního tajemství

ISBN

978-0815513315

Keywords in English

surface; cleaning

Změněno: 5/1/2009 14:13, RNDr. Petr Pánek, Ph.D.

KERN, Werner. Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology, and Applications. New Jersey, U.S.A.: Noyes Publications, 1993, 623 pp. Materials Science and Process Technology Series. ISBN 978-0815513315.

@book{806484,
   author = {Kern, Werner},
   address = {New Jersey, U.S.A.},
   keywords = {surface; cleaning},
   location = {New Jersey, U.S.A.},
   isbn = {978-0815513315},
   publisher = {Noyes Publications},
   title = {Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology, and Applications},
   year = {1993}
}

TY  - BOOK
ID  - 806484
AU  - Kern, Werner
PY  - 1993
TI  - Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology, and Applications
VL  - Materials Science and Process Technology Series
PB  - Noyes Publications
CY  - New Jersey, U.S.A.
SN  - 9780815513315
KW  - surface
KW  - cleaning
ER  -

KERN, Werner. \textit{Handbook of Semiconductor Wafer Cleaning Technology: Science, Technology, and Applications}. New Jersey, U.S.A.: Noyes Publications, 1993, 623 pp. Materials Science and Process Technology Series. ISBN~978-0815513315.