2008
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
VALTR, Miroslav, Petr KLAPETEK, Vilma BURŠÍKOVÁ, Ivan OHLÍDAL, Daniel FRANTA et. al.Základní údaje
Originální název
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
Název česky
Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
Autoři
VALTR, Miroslav (203 Česká republika), Petr KLAPETEK (203 Česká republika), Vilma BURŠÍKOVÁ (203 Česká republika, garant), Ivan OHLÍDAL (203 Česká republika) a Daniel FRANTA (203 Česká republika)
Vydání
2nd Central European Symposium on Plasma Chemistry, 2008
Další údaje
Jazyk
angličtina
Typ výsledku
Konferenční abstrakt
Obor
10305 Fluids and plasma physics
Stát vydavatele
Česká republika
Utajení
není předmětem státního či obchodního tajemství
Kód RIV
RIV/00216224:14310/08:00025189
Organizační jednotka
Přírodovědecká fakulta
UT WoS
000208452600051
Klíčová slova anglicky
Surface; morphology; amorphous hydrocarbon thin films; pulsed radiofrequency discharge
Příznaky
Mezinárodní význam
Změněno: 14. 1. 2009 13:59, Mgr. Adrian Stoica, Ph.D.
V originále
Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of the common techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aim of this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films.
Česky
Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of the common techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aim of this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films.
Návaznosti
| GA202/07/1669, projekt VaV |
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