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@proceedings{813598,
author = {Valtr, Miroslav and Klapetek, Petr and Buršíková, Vilma and Ohlídal, Ivan and Franta, Daniel},
booktitle = {2nd Central European Symposium on Plasma Chemistry},
keywords = {Surface; morphology; amorphous hydrocarbon thin films; pulsed radiofrequency discharge},
language = {eng},
title = {Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge},
year = {2008}
}
TY - CONF
ID - 813598
AU - Valtr, Miroslav - Klapetek, Petr - Buršíková, Vilma - Ohlídal, Ivan - Franta, Daniel
PY - 2008
TI - Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge
KW - Surface
KW - morphology
KW - amorphous hydrocarbon thin films
KW - pulsed radiofrequency discharge
N2 - Amorphous hydrocarbon thin films are still very attractive materials for many scientists. They are used in wide range of applications like optical devices, integrated digital circuits, micro-electromechanical devices, biomedical coatings, etc. One of the common techniques of preparation of such films is the plasma enhanced chemical vapor deposition. The properties of resulted thin films are strongly dependent on deposition parameters. Usually, continuous mode of operation is used in the deposition process, but running the deposition in pulsed mode offers another possibility to vary the material properties. One of the aspects of deposited thin film is the surface morphology, which can play a crucial role in industrial applications of the films. The aim of this work is therefore the investigation of surface parameters like roughness and autocorrelation length of thin films.
ER -
VALTR, Miroslav, Petr KLAPETEK, Vilma BURŠÍKOVÁ, Ivan OHLÍDAL a Daniel FRANTA. Surface morphology of amorphous hydrocarbon thin films deposited in pulsed radiofrequency discharge. In \textit{2nd Central European Symposium on Plasma Chemistry}. 2008.
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