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@inproceedings{818801,
author = {Maršík, Přemysl and Urbanowicz, Adam and Vinokur, Klara and Cohen, Yoel and Baklanov, Mikhail},
address = {Warrendale},
booktitle = {Materials Research Society Symposium Proceedings},
edition = {1079E},
keywords = {low-k; plasma damage; scatterometry},
language = {eng},
location = {Warrendale},
isbn = {978-1-60511-077-6},
publisher = {Materials Research Society},
title = {Changes of UV Optical Properties of Plasma Damaged Low-k Dielectrics for Sidewall Damage Scatterometry},
url = {http://www.mrs.org/s_mrs/sec_subscribe.asp?CID=12434&DID=215838&action=detail},
year = {2008}
}
TY - JOUR
ID - 818801
AU - Maršík, Přemysl - Urbanowicz, Adam - Vinokur, Klara - Cohen, Yoel - Baklanov, Mikhail
PY - 2008
TI - Changes of UV Optical Properties of Plasma Damaged Low-k Dielectrics for Sidewall Damage Scatterometry
PB - Materials Research Society
CY - Warrendale
SN - 9781605110776
KW - low-k
KW - plasma damage
KW - scatterometry
UR - http://www.mrs.org/s_mrs/sec_subscribe.asp?CID=12434&DID=215838&action=detail
N2 - Porous low-k dielectrics were studied to determine the changes of optical properties after various plasma treatments for development of scatterometry technique for evaluation of the trench/via sidewall plasma damage. The SiCOH porogen based low-k films were prepared by PE-CVD. The deposited and UV-cured low-k films have been damaged by striping O2Cl2, O2, NH3 and H2N2 based plasmas and CF4/CH2F2/Ar etching plasma. Blanket wafers were studied in this work for the simplicity of thin film optical model. The optical properties of the damaged low-k dielectrics are evaluated the using various angle spectroscopic ellipsometry in range from 2 to 9 eV. Multilayer optical model is applied to fit the measured quantities and the validity is supported by other techniques. The atomic concentration profiles of Si, C, O and H were stated by TOF-SIMS and changes in overall chemical composition were derived from FTIR. Toluene and water based ellipsometric porosimetry is involved to examine the porosity, pore interconnectivity and internal hydrophilicity.
ER -
MARŠÍK, Přemysl, Adam URBANOWICZ, Klara VINOKUR, Yoel COHEN a Mikhail BAKLANOV. Changes of UV Optical Properties of Plasma Damaged Low-k Dielectrics for Sidewall Damage Scatterometry. In \textit{Materials Research Society Symposium Proceedings}. 1079E. Warrendale: Materials Research Society, 2008, 6 s. ISBN~978-1-60511-077-6.
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