LEHOCKÝ, Marian, Pavel SŤAHEL, Marek KOUTNÝ, Jan ČECH, Jakub INSTITORIS a Aleš MRÁČEK. Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces. Journal of Materials Processing Technology. Elsevier B.V., 2008, roč. 209, č. 6, s. 2871–2875. ISSN 0924-0136. |
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@article{834329, author = {Lehocký, Marian and Sťahel, Pavel and Koutný, Marek and Čech, Jan and Institoris, Jakub and Mráček, Aleš}, article_number = {6}, keywords = {Rhodococcus; Plasma deposition; Cell adhesion; Barrier discharge; Thin films}, language = {eng}, issn = {0924-0136}, journal = {Journal of Materials Processing Technology}, note = {doi:10.1016/j.jmatprotec.2008.06.042}, title = {Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces}, volume = {209}, year = {2008} }
TY - JOUR ID - 834329 AU - Lehocký, Marian - Sťahel, Pavel - Koutný, Marek - Čech, Jan - Institoris, Jakub - Mráček, Aleš PY - 2008 TI - Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces JF - Journal of Materials Processing Technology VL - 209 IS - 6 SP - 2871–2875 EP - 2871–2875 PB - Elsevier B.V. SN - 09240136 N1 - doi:10.1016/j.jmatprotec.2008.06.042 KW - Rhodococcus KW - Plasma deposition KW - Cell adhesion KW - Barrier discharge KW - Thin films N2 - Investigation of Rhodococcus SP.S3E2 and Rhodococcus SP.S3E3 adhesion to hydrophobic teflon like films and organosilicon films deposited on the paper substrate. ER -
LEHOCKÝ, Marian, Pavel SŤAHEL, Marek KOUTNÝ, Jan ČECH, Jakub INSTITORIS a Aleš MRÁČEK. Adhesion of Rhodococcus sp. S3E2 and Rhodococcus sp. S3E3 to plasma prepared Teflon-like and organosilicon surfaces. \textit{Journal of Materials Processing Technology}. Elsevier B.V., 2008, roč.~209, č.~6, s.~2871–2875. ISSN~0924-0136.
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