Detailed Information on Publication Record
2009
Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen
SCHMIDTOVÁ, Tereza and Petr VAŠINABasic information
Original name
Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen
Name in Czech
Modelování magnetronového naprašování v dusiku a vodíku
Authors
SCHMIDTOVÁ, Tereza (203 Czech Republic) and Petr VAŠINA (203 Czech Republic, guarantor)
Edition
Brno, Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8, p. 75-75, 1 pp. 2009
Publisher
Brno University of Technology
Other information
Language
English
Type of outcome
Stať ve sborníku
Field of Study
10305 Fluids and plasma physics
Country of publisher
Czech Republic
Confidentiality degree
není předmětem státního či obchodního tajemství
RIV identification code
RIV/00216224:14310/09:00029368
Organization unit
Faculty of Science
ISBN
978-80-214-3875-0
Keywords (in Czech)
modelovaní; magnetron
Keywords in English
modelling; magnetron
Tags
International impact, Reviewed
Změněno: 24/6/2009 13:15, prof. Mgr. Petr Vašina, Ph.D.
V originále
Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen, procceding
In Czech
Modelování magnetronového naprašování v dusiku a vodíku, sborník
Links
GP202/08/P038, research and development project |
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MSM0021622411, plan (intention) |
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