D 2009

Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen

SCHMIDTOVÁ, Tereza and Petr VAŠINA

Basic information

Original name

Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen

Name in Czech

Modelování magnetronového naprašování v dusiku a vodíku

Authors

SCHMIDTOVÁ, Tereza (203 Czech Republic) and Petr VAŠINA (203 Czech Republic, guarantor)

Edition

Brno, Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8, p. 75-75, 1 pp. 2009

Publisher

Brno University of Technology

Other information

Language

English

Type of outcome

Stať ve sborníku

Field of Study

10305 Fluids and plasma physics

Country of publisher

Czech Republic

Confidentiality degree

není předmětem státního či obchodního tajemství

RIV identification code

RIV/00216224:14310/09:00029368

Organization unit

Faculty of Science

ISBN

978-80-214-3875-0

Keywords (in Czech)

modelovaní; magnetron

Keywords in English

modelling; magnetron

Tags

International impact, Reviewed
Změněno: 24/6/2009 13:15, prof. Mgr. Petr Vašina, Ph.D.

Abstract

V originále

Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen, procceding

In Czech

Modelování magnetronového naprašování v dusiku a vodíku, sborník

Links

GP202/08/P038, research and development project
Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev
Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition
MSM0021622411, plan (intention)
Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface