ELIÁŠ, Marek, Pavel SOUČEK a Petr VAŠINA. Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics. In Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8. Brno: Brno University of Technology, 2009, s. 87-87. ISBN 978-80-214-3875-0. |
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@inproceedings{838260, author = {Eliáš, Marek and Souček, Pavel and Vašina, Petr}, address = {Brno}, booktitle = {Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8}, keywords = {hybrid PVD-PECVD}, language = {eng}, location = {Brno}, isbn = {978-80-214-3875-0}, pages = {87-87}, publisher = {Brno University of Technology}, title = {Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics}, year = {2009} }
TY - JOUR ID - 838260 AU - Eliáš, Marek - Souček, Pavel - Vašina, Petr PY - 2009 TI - Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics PB - Brno University of Technology CY - Brno SN - 9788021438750 KW - hybrid PVD-PECVD N2 - Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics, proceeding ER -
ELIÁŠ, Marek, Pavel SOUČEK a Petr VAŠINA. Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics. In \textit{Book of Abstracts, Frontiers in Low Temperature Plasma Diagnostics 8}. Brno: Brno University of Technology, 2009, s.~87-87. ISBN~978-80-214-3875-0.
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