Spectroscopic ellipsometry and polarimetry for materials and
systems analysis at the nanometer scale: state-of-the-art,
potential, and perspectives

J 2009

Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives

LOSURDO, Maria; Michael BERGMAIR; Giovanni BRUNO; D. CATELLAN; C. COBET et. al.

Basic information

Original name

Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives

Name in Czech

Spektroskopická elipsometrie a polarimetrie materiálů and systémová analýza na nanometrové škále: současný stav, potenciál a perspektivy

Authors

LOSURDO, Maria (380 Italy); Michael BERGMAIR (40 Austria); Giovanni BRUNO (380 Italy); D. CATELLAN (250 France); C. COBET (203 Czech Republic); A. DE MARTINO (250 France); K. FLEISCHER (276 Germany); Z. DOHCEVIC-MITROVIC (688 Serbia); N. ESSER (276 Germany); M. GAILLET (250 France); R. GAJIC (688 Serbia); Dušan HEMZAL (203 Czech Republic, belonging to the institution); K. HINGERL (40 Austria); Josef HUMLÍČEK (203 Czech Republic, guarantor, belonging to the institution); R. OSSIKOVSKI (250 France); Z.V. POPOVIC (688 Serbia) and O. SAXL (826 United Kingdom of Great Britain and Northern Ireland)

Edition

Journal of Nanoparticle Research, Dordrecht, Springer Netherlands, 2009, 1388-0764

Other information

Language

English

Type of outcome

Article in a journal

Field of Study

10302 Condensed matter physics

Country of publisher

Netherlands

Confidentiality degree

is not subject to a state or trade secret

Impact factor

Impact factor: 2.478

RIV identification code

RIV/00216224:14310/09:00037726

Organization unit

Faculty of Science

UT WoS

000270543100001

Keywords (in Czech)

Spektroskopická elipsometrie; Polarimetrie; Nanomateriály; Nanočástice.

Keywords in English

Spectroscopic ellipsometry; Polarimetry; Nanomaterials; Nanoparticles; Thin films; Optical characterization; Nanometrology.

Abstract

ORIG CZ

In the original language

This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale. These techniques include spectroscopic ellipsometry, polarimetry, and reflectance anisotropy. We give an overview of the various ellipsometry strategies for the measurement and analysis of nanometric films, metal nanoparticles and nanowires, semiconductor nanocrystals, and submicron periodic structures. We show that ellipsometry is capable of more than the determination of thickness and optical properties, and it can be exploited to gain information about process control, This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale.

In Czech

Tato práce diskutuje základy, aplikace, potenciál, omezení a perspektivy polarizačních reflexních technik pro charakterizaci materiálů a systémů na nanometrovém měřítku.

Links

MSM0021622410, plan (intention)

Name: Fyzikální a chemické vlastnosti pokročilých materiálů a struktur

Investor: Ministry of Education, Youth and Sports of the CR, Physical and chemical properties of advanced materials and structures

Cite

LOSURDO, Maria; Michael BERGMAIR; Giovanni BRUNO; D. CATELLAN; C. COBET; A. DE MARTINO; K. FLEISCHER; Z. DOHCEVIC-MITROVIC; N. ESSER; M. GAILLET; R. GAJIC; Dušan HEMZAL; K. HINGERL; Josef HUMLÍČEK; R. OSSIKOVSKI; Z.V. POPOVIC and O. SAXL. Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives. Journal of Nanoparticle Research. Dordrecht: Springer Netherlands, 2009, vol. 11, No 7, p. 1521-1554. ISSN 1388-0764.

@article{861755,
   author = {Losurdo, Maria and Bergmair, Michael and Bruno, Giovanni and Catellan, D. and Cobet, C. and de Martino, A. and Fleischer, K. and DohcevicandMitrovic, Z. and Esser, N. and Gaillet, M. and Gajic, R. and Hemzal, Dušan and Hingerl, K. and Humlíček, Josef and Ossikovski, R. and Popovic, Z.V. and Saxl, O.},
   article_location = {Dordrecht},
   article_number = {7},
   keywords = {Spectroscopic ellipsometry; Polarimetry; Nanomaterials; Nanoparticles; Thin films; Optical characterization; Nanometrology.},
   language = {eng},
   issn = {1388-0764},
   journal = {Journal of Nanoparticle Research},
   title = {Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives},
   volume = {11},
   year = {2009}
}

TY  - JOUR
ID  - 861755
AU  - Losurdo, Maria - Bergmair, Michael - Bruno, Giovanni - Catellan, D. - Cobet, C. - de Martino, A. - Fleischer, K. - Dohcevic-Mitrovic, Z. - Esser, N. - Gaillet, M. - Gajic, R. - Hemzal, Dušan - Hingerl, K. - Humlíček, Josef - Ossikovski, R. - Popovic, Z.V. - Saxl, O.
PY  - 2009
TI  - Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives
JF  - Journal of Nanoparticle Research
VL  - 11
IS  - 7
SP  - 1521-1554
EP  - 1521-1554
PB  - Springer Netherlands
SN  - 13880764
KW  - Spectroscopic ellipsometry
KW  - Polarimetry
KW  - Nanomaterials
KW  - Nanoparticles
KW  - Thin films
KW  - Optical characterization
KW  - Nanometrology.
N2  - This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale. These techniques include spectroscopic ellipsometry, polarimetry, and reflectance anisotropy. We give an overview of the various ellipsometry strategies for the measurement and analysis of nanometric films, metal nanoparticles and nanowires, semiconductor nanocrystals, and submicron periodic structures. We show that ellipsometry is capable of more than the determination of thickness and optical properties, and it can be exploited to gain information about process control, This paper discusses the fundamentals, applications, potential, limitations, and future perspectives of polarized light reflection techniques for the characterization of materials and related systems and devices at the nanoscale.
ER  -

LOSURDO, Maria; Michael BERGMAIR; Giovanni BRUNO; D. CATELLAN; C. COBET; A. DE MARTINO; K. FLEISCHER; Z. DOHCEVIC-MITROVIC; N. ESSER; M. GAILLET; R. GAJIC; Dušan HEMZAL; K. HINGERL; Josef HUMLÍČEK; R. OSSIKOVSKI; Z.V. POPOVIC and O. SAXL. Spectroscopic ellipsometry and polarimetry for materials and systems analysis at the nanometer scale: state-of-the-art, potential, and perspectives. \textit{Journal of Nanoparticle Research}. Dordrecht: Springer Netherlands, 2009, vol.~11, No~7, p.~1521-1554. ISSN~1388-0764.

Přehled o publikaci