KUBĚNA, Josef, Alan KUBĚNA, Ondřej CAHA a Mojmír MEDUŇA. Analysis of vacancy and interstitial nucleation kinetics in Si wafers during rapid thermal annealing. J.Phys.: Condens. Matter. Velká Britanie: IOP Publishing Ltd, 2009, roč. 21, č. 10, s. 105402-105412. ISSN 0953-8984. |
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@article{862549, author = {Kuběna, Josef and Kuběna, Alan and Caha, Ondřej and Meduňa, Mojmír}, article_location = {Velká Britanie}, article_number = {10}, keywords = {Silicon; vacancies; Interstitials; nucleation}, language = {eng}, issn = {0953-8984}, journal = {J.Phys.: Condens. Matter}, title = {Analysis of vacancy and interstitial nucleation kinetics in Si wafers during rapid thermal annealing}, volume = {21}, year = {2009} }
TY - JOUR ID - 862549 AU - Kuběna, Josef - Kuběna, Alan - Caha, Ondřej - Meduňa, Mojmír PY - 2009 TI - Analysis of vacancy and interstitial nucleation kinetics in Si wafers during rapid thermal annealing JF - J.Phys.: Condens. Matter VL - 21 IS - 10 SP - 105402 EP - 105402 PB - IOP Publishing Ltd SN - 09538984 KW - Silicon KW - vacancies KW - Interstitials KW - nucleation N2 - The kinetics of the vacancy and self interstitial processes in Si wafers are studied in this paper. Detailed insight into nucleation processes, out diffusion and vacancy interstitial recombination during the RTA leads to a new model of interaction between vacancies and oxygen. ER -
KUBĚNA, Josef, Alan KUBĚNA, Ondřej CAHA a Mojmír MEDUŇA. Analysis of vacancy and interstitial nucleation kinetics in Si wafers during rapid thermal annealing. \textit{J.Phys.: Condens. Matter}. Velká Britanie: IOP Publishing Ltd, 2009, roč.~21, č.~10, s.~105402-105412. ISSN~0953-8984.
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