Modeling of reactive magnetron sputtering deposition process - different target utilization, ...
| VAŠINA, Petr and Tereza SCHMIDTOVÁ. Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously. In Proceeding of 19th International Symposium on Plasma Chemistry. 2009. |
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| Basic information | |
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| Original name | Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously |
| Name in Czech | Modelování magnetronového naprašování - různé využití terče, situace s dvěma reaktivními plyny |
| Authors | VAŠINA, Petr (203 Czech Republic, guarantor, belonging to the institution) and Tereza SCHMIDTOVÁ (203 Czech Republic, belonging to the institution). |
| Edition | Proceeding of 19th International Symposium on Plasma Chemistry, 2009. |
| Other information | |
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| Original language | English |
| Type of outcome | Conference abstract |
| Field of Study | 10305 Fluids and plasma physics |
| Country of publisher | Germany |
| Confidentiality degree | is not subject to a state or trade secret |
| RIV identification code | RIV/00216224:14310/09:00049601 |
| Organization unit | Faculty of Science |
| Keywords (in Czech) | reaktivní naprašování |
| Keywords in English | reactive magnetron sputering; target; modeling |
| Tags | IK, rivok |
| Changed by | Changed by: Mgr. Tereza Schmidtová, Ph.D., učo 151253. Changed: 5/4/2012 14:18. |
| Abstract |
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| Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously, proceeding |
| Abstract (in Czech) |
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| Modelování magnetronového naprašování - různé využití terče, situace s dvěma reaktivními plyny, sborník |
| Links | |
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| GP202/08/P038, research and development project | Name: Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev |
| Investor: Czech Science Foundation, Study of hybrid deposition process and its application for thin film deposition | |
| MSM0021622411, plan (intention) | Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek |
| Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface | |
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