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@inproceedings{894944,
author = {Skácelová, Dana and Haničinec, Martin and Sťahel, Pavel and Černák, Mirko},
address = {Plzeň},
booktitle = {Potential and Applications of Thin Ceramic and Metal Coatings},
keywords = {silicon surface - dielectric barrier discharge - plasma treatment},
language = {eng},
location = {Plzeň},
isbn = {978-80-7043-894-7},
pages = {77-78},
publisher = {University of West Bohemia},
title = {Plasma treatment of silicon surface},
year = {2010}
}
TY - JOUR
ID - 894944
AU - Skácelová, Dana - Haničinec, Martin - Sťahel, Pavel - Černák, Mirko
PY - 2010
TI - Plasma treatment of silicon surface
PB - University of West Bohemia
CY - Plzeň
SN - 9788070438947
KW - silicon surface - dielectric barrier discharge - plasma treatment
N2 - The contribution focuses on the plasma treatment of crystalline silicon surface. The plasma was generated by Diffuse Coplanar Surface Barrier Discharge (DCSBD) at atmospheric pressure in an ambient air. By means of the contact angle measurements surface free energy was studied an by atomic force microscope (AFM) the surface roughness of silicon before and after plasma treatment was investigated.
ER -
SKÁCELOVÁ, Dana, Martin HANIČINEC, Pavel SŤAHEL a Mirko ČERNÁK. Plasma treatment of silicon surface. In \textit{Potential and Applications of Thin Ceramic and Metal Coatings}. Plzeň: University of West Bohemia, 2010, s.~77-78. ISBN~978-80-7043-894-7.
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