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@inproceedings{902185,
author = {Schmidtová, Tereza and Vašina, Petr},
address = {Japonsko},
booktitle = {7th ICRP & 63rd GEC - CONFERENCE PROCEEDINGS},
keywords = {hybrid PVD-PECVD process; magnetron sputtering; hysteresis; OES},
language = {eng},
location = {Japonsko},
isbn = {978-4-86348-101-5},
publisher = {Japan Society of Applied Physics},
title = {Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering},
year = {2010}
}
TY - JOUR
ID - 902185
AU - Schmidtová, Tereza - Vašina, Petr
PY - 2010
TI - Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering
PB - Japan Society of Applied Physics
CY - Japonsko
SN - 9784863481015
KW - hybrid PVD-PECVD process
KW - magnetron sputtering
KW - hysteresis
KW - OES
N2 - Hybrid PVD-PECVD sputtering process was studied in comparison with conventional reactive magnetron sputtering. Titanium target was sputtered in argon plus oxygen atmosphere for conventional reactive sputtering and in argon plus acetylene for hybrid process. The hybrid PVD-PECVD combines aspects of both processes: conventional sputtering of metal target but source of carbon was hydrocarbon vapour. We report differences in behaviour of these two processes, discuss necessary time for hybrid process to achieve steady state conditions and suggest modification of Berg's model for reactive magnetron sputtering to predict behaviour of hybrid process.
ER -
SCHMIDTOVÁ, Tereza a Petr VAŠINA. Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering. In \textit{7th ICRP \&{} 63rd GEC - CONFERENCE PROCEEDINGS}. Japonsko: Japan Society of Applied Physics, 2010, 2 s. ISBN~978-4-86348-101-5.
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