SKÁCELOVÁ, Dana, Pavel SŤAHEL, Martin HANIČINEC a Mirko ČERNÁK. Plasma treatment of silicon surface by DCSBD. Acta Technica CSAV. Praha, ČR: ČSAV Praha, 2011, Volume 56, č. 2011, s. 356-361. ISSN 0001-7043. |
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@article{953447, author = {Skácelová, Dana and Sťahel, Pavel and Haničinec, Martin and Černák, Mirko}, article_location = {Praha, ČR}, article_number = {2011}, keywords = {Silicon surface plasma treatment DBD discharge AFM contact angle measurement}, language = {eng}, issn = {0001-7043}, journal = {Acta Technica CSAV}, title = {Plasma treatment of silicon surface by DCSBD}, volume = {Volume 56}, year = {2011} }
TY - JOUR ID - 953447 AU - Skácelová, Dana - Sťahel, Pavel - Haničinec, Martin - Černák, Mirko PY - 2011 TI - Plasma treatment of silicon surface by DCSBD JF - Acta Technica CSAV VL - Volume 56 IS - 2011 SP - 356-361 EP - 356-361 PB - ČSAV Praha SN - 00017043 KW - Silicon surface plasma treatment DBD discharge AFM contact angle measurement N2 - This paper focuses on the plasma treatment of crystalline Si (100) surface. The plasma was generated by Diffuse Coplanar Surface Barrier Discharge (DCSBD) at atmospheric pressure using ambient atmosphere. Surface free energy of silicon was investigated by contact angle measurement and surface morphology was studied by Atomic force microscope. Plasma treatment increases the surface wettability and AFM measurements showed that the plasma influences also the surface roughness. ER -
SKÁCELOVÁ, Dana, Pavel SŤAHEL, Martin HANIČINEC a Mirko ČERNÁK. Plasma treatment of silicon surface by DCSBD. \textit{Acta Technica CSAV}. Praha, ČR: ČSAV Praha, 2011, Volume 56, č.~2011, s.~356-361. ISSN~0001-7043.
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