Optical characterization of HfO2 thin films

J 2011

Optical characterization of HfO2 thin films

FRANTA, Daniel, Ivan OHLÍDAL, David NEČAS, František VIŽĎA, Ondřej CAHA et. al.

Basic information

Original name

Optical characterization of HfO2 thin films

Name in Czech

Optická charakterizace tenkých vrstev HfO2

Authors

FRANTA, Daniel (203 Czech Republic, guarantor, belonging to the institution), Ivan OHLÍDAL (203 Czech Republic, belonging to the institution), David NEČAS (203 Czech Republic, belonging to the institution), František VIŽĎA (203 Czech Republic), Ondřej CAHA (203 Czech Republic, belonging to the institution), Martin HASOŇ (203 Czech Republic, belonging to the institution) and Pavel POKORNÝ (203 Czech Republic)

Edition

Thin Solid Films, Oxford, UK, Elsevier, 2011, 0040-6090

Other information

Language

English

Type of outcome

Článek v odborném periodiku

Field of Study

10306 Optics

Country of publisher

United Kingdom of Great Britain and Northern Ireland

Confidentiality degree

není předmětem státního či obchodního tajemství

References:

URL

Impact factor

Impact factor: 1.890

RIV identification code

RIV/00216224:14310/11:00055011

Organization unit

Faculty of Science

DOI

http://dx.doi.org/10.1016/j.tsf.2011.03.128

UT WoS

000292576500042

Keywords (in Czech)

Optické vlastnosti; elipsometrie; spektrofotometrie; oxid hafničitý; oxidy přechodových kovů; Urbachův ocas

Keywords in English

Optical properties; Ellipsometry; Spectrophotometry; Hafnium oxide; Transition-metal oxide; Urbach tail

Abstract

V originále

Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 degrees C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO(2) films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the film optical constants are expressed using a recently developed parametrized joint density of states model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail.

Links

MSM0021622411, plan (intention)

Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek

Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface

Citovat

FRANTA, Daniel, Ivan OHLÍDAL, David NEČAS, František VIŽĎA, Ondřej CAHA, Martin HASOŇ and Pavel POKORNÝ. Optical characterization of HfO2 thin films. Thin Solid Films. Oxford, UK: Elsevier, 2011, vol. 519, No 18, p. 6085–6091. ISSN 0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2011.03.128.

@article{966962,
   author = {Franta, Daniel and Ohlídal, Ivan and Nečas, David and Vižďa, František and Caha, Ondřej and Hasoň, Martin and Pokorný, Pavel},
   article_location = {Oxford, UK},
   article_number = {18},
   doi = {http://dx.doi.org/10.1016/j.tsf.2011.03.128},
   keywords = {Optical properties; Ellipsometry; Spectrophotometry; Hafnium oxide; Transition-metal oxide; Urbach tail},
   language = {eng},
   issn = {0040-6090},
   journal = {Thin Solid Films},
   title = {Optical characterization of HfO2 thin films},
   url = {http://www.sciencedirect.com/science/article/pii/S0040609011007863},
   volume = {519},
   year = {2011}
}

TY  - JOUR
ID  - 966962
AU  - Franta, Daniel - Ohlídal, Ivan - Nečas, David - Vižďa, František - Caha, Ondřej - Hasoň, Martin - Pokorný, Pavel
PY  - 2011
TI  - Optical characterization of HfO2 thin films
JF  - Thin Solid Films
VL  - 519
IS  - 18
SP  - 6085–6091
EP  - 6085–6091
PB  - Elsevier
SN  - 00406090
KW  - Optical properties
KW  - Ellipsometry
KW  - Spectrophotometry
KW  - Hafnium oxide
KW  - Transition-metal oxide
KW  - Urbach tail
UR  - http://www.sciencedirect.com/science/article/pii/S0040609011007863
L2  - http://www.sciencedirect.com/science/article/pii/S0040609011007863
N2  - Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 degrees C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO(2) films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the film optical constants are expressed using a recently developed parametrized joint density of states model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail.
ER  -

FRANTA, Daniel, Ivan OHLÍDAL, David NEČAS, František VIŽĎA, Ondřej CAHA, Martin HASOŇ and Pavel POKORNÝ. Optical characterization of HfO2 thin films. \textit{Thin Solid Films}. Oxford, UK: Elsevier, 2011, vol.~519, No~18, p.~6085–6091. ISSN~0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2011.03.128.

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