FRANTA, Daniel, Ivan OHLÍDAL, David NEČAS, František VIŽĎA, Ondřej CAHA, Martin HASOŇ and Pavel POKORNÝ. Optical characterization of HfO2 thin films. Thin Solid Films. Oxford, UK: Elsevier, 2011, vol. 519, No 18, p. 6085–6091. ISSN 0040-6090. Available from: https://dx.doi.org/10.1016/j.tsf.2011.03.128.
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Basic information
Original name Optical characterization of HfO2 thin films
Name in Czech Optická charakterizace tenkých vrstev HfO2
Authors FRANTA, Daniel (203 Czech Republic, guarantor, belonging to the institution), Ivan OHLÍDAL (203 Czech Republic, belonging to the institution), David NEČAS (203 Czech Republic, belonging to the institution), František VIŽĎA (203 Czech Republic), Ondřej CAHA (203 Czech Republic, belonging to the institution), Martin HASOŇ (203 Czech Republic, belonging to the institution) and Pavel POKORNÝ (203 Czech Republic).
Edition Thin Solid Films, Oxford, UK, Elsevier, 2011, 0040-6090.
Other information
Original language English
Type of outcome Article in a journal
Field of Study 10306 Optics
Country of publisher United Kingdom of Great Britain and Northern Ireland
Confidentiality degree is not subject to a state or trade secret
WWW URL
Impact factor Impact factor: 1.890
RIV identification code RIV/00216224:14310/11:00055011
Organization unit Faculty of Science
Doi http://dx.doi.org/10.1016/j.tsf.2011.03.128
UT WoS 000292576500042
Keywords (in Czech) Optické vlastnosti; elipsometrie; spektrofotometrie; oxid hafničitý; oxidy přechodových kovů; Urbachův ocas
Keywords in English Optical properties; Ellipsometry; Spectrophotometry; Hafnium oxide; Transition-metal oxide; Urbach tail
Tags AKR, rivok
Tags International impact, Reviewed
Changed by Changed by: Mgr. David Nečas, Ph.D., učo 19972. Changed: 23/3/2012 13:22.
Abstract
Hafnia films prepared onto silicon wafers at three substrate temperatures of 40, 160 and 280 degrees C are optically characterized utilizing the multi-sample method. The characterization uses the combination of variable angle spectroscopic ellipsometry and spectroscopic reflectometry within the spectral region 1.24-6.5 eV (190-1000 nm). The structural model of the HfO(2) films includes boundary nanometric roughness, thickness non-uniformity and refractive index profile. Spectral dependences of the film optical constants are expressed using a recently developed parametrized joint density of states model describing the dielectric response of both interband transitions and excitations of localized states below the band gap. It is shown that the observed weak absorption below the band gap does not correspond to the Urbach tail.
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MSM0021622411, plan (intention)Name: Studium a aplikace plazmochemických reakcí v neizotermickém nízkoteplotním plazmatu a jeho interakcí s povrchem pevných látek
Investor: Ministry of Education, Youth and Sports of the CR, Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
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