Measurement of hydroxyl (OH) concentration in an atmospheric radiofrequency discharge by laser ...
VORÁČ, Jan, Vojtěch PROCHÁZKA and Pavel DVOŘÁK. Measurement of hydroxyl (OH) concentration in an atmospheric radiofrequency discharge by laser induced fluorescence. In Potential and Application of Nanotreatment of Medical Surfaces. 2012. ISBN 978-80-7372-890-8. |
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Basic information | |
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Original name | Measurement of hydroxyl (OH) concentration in an atmospheric radiofrequency discharge by laser induced fluorescence |
Name in Czech | Měření koncentrace hydroxylových (OH) radikálů v atmosférickém vysokofrekvenčním výboji pomocí laserem indukované fluorescence |
Authors | VORÁČ, Jan (203 Czech Republic, belonging to the institution), Vojtěch PROCHÁZKA (203 Czech Republic, belonging to the institution) and Pavel DVOŘÁK (203 Czech Republic, guarantor, belonging to the institution). |
Edition | Potential and Application of Nanotreatment of Medical Surfaces, 2012. |
Other information | |
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Original language | English |
Type of outcome | Conference abstract |
Field of Study | 10305 Fluids and plasma physics |
Country of publisher | Czech Republic |
Confidentiality degree | is not subject to a state or trade secret |
RIV identification code | RIV/00216224:14310/12:00060778 |
Organization unit | Faculty of Science |
ISBN | 978-80-7372-890-8 |
Keywords (in Czech) | plazmová tužka; hydroxyl; OH; LIF |
Keywords in English | plasma pencil; hydroxyl; OH; LIF |
Changed by | Changed by: Mgr. Jan Voráč, Ph.D., učo 175282. Changed: 20/3/2013 09:45. |
Abstract |
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The OH concentration in a plasma pencil, an atmospheric RF plasma jet, was measured by laser induced fluorescence. The OH concentration was found to be in the order of 10^20 m^-3. |
Abstract (in Czech) |
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Měření koncentrace OH radikálů metodou LIF v plazmové tužce. |
Links | |
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CZ.1.05/2.1.00/03.0086, interní kód MU | Name: CEPLANT - Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy |
Investor: Ministry of Education, Youth and Sports of the CR, 2.1 Regional R&D Centres | |
ED2.1.00/03.0086, research and development project | Name: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy |
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