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Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds J - Článek v odborném periodikuZAJÍČKOVÁ, Lenka; Jan JANČA a Vratislav PERINA. Characterisation of Silicon Oxide Thin Films Deposited by Plasma Enhanced CVD from Octamethylcyclotetrasiloxane/Oxygen Feeds. Thin Solid Films. New York: Elsevier, 1999, roč. 338, č. 1, s. 49-59. ISSN 0042-6090/99.Podrobněji: https://is.muni.cz/publication/230945/cs