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Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses J - Článek v odborném periodikuZAJÍČKOVÁ, Lenka; Ivan OHLÍDAL a Jan JANČA. Plasma Enhanced Chemical Vapour Deposition of Thin Films from Tetraethoxysilane and Methanol: Optical Properties and XPS Analyses. Thin Solid Films. UK Oxford: Elsevier science, 1996, roč. 1996, č. 280, s. 26-36. ISSN 0040-6090.Podrobněji: https://is.muni.cz/publication/197508/cs