Study of hybrid PVD-PECVD process and its application for
metal/carbon film deposition

a 2012

Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition

VAŠINA, Petr, Tereza SCHMIDTOVÁ, Pavel SOUČEK a Vilma BURŠÍKOVÁ

Základní údaje

Originální název

Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition

Autoři

VAŠINA, Petr (203 Česká republika, garant, domácí), Tereza SCHMIDTOVÁ (203 Česká republika, domácí), Pavel SOUČEK (203 Česká republika, domácí) a Vilma BURŠÍKOVÁ (203 Česká republika, domácí)

Vydání

E-MRS 2012 Spring Meeting, 2012

Další údaje

Jazyk

angličtina

Typ výsledku

Konferenční abstrakt

Obor

10305 Fluids and plasma physics

Stát vydavatele

Francie

Utajení

není předmětem státního či obchodního tajemství

Kód RIV

RIV/00216224:14310/12:00057674

Organizační jednotka

Přírodovědecká fakulta

Klíčová slova anglicky

hybrid PVD-PECVD; magnetron sputtering; metal/carbon

Štítky

AKR, rivok

Změněno: 23. 4. 2013 09:34, Ing. Andrea Mikešková

Anotace

V originále

Hybrid PVD-PECVD process of titanium sputtering in mixture of argon and acetylene combines aspects of both conventional techniques: sputtering of titanium target (PVD) and deposition from acetylene which acts as a source of carbon for polymerization (PECVD). This contribution reports and corelates both the properties of the deposited coating and the deposition process characteristics. nc-TiC/a-C:H coating with hardness and Young’s modulus over 40 GPa and 400 GPa respectively with adhesion in range HF0-HF1 on Ti coated HSS and WC were prepared. Hysteresis free and non-monotonous evolution of discharge voltage determines three characteristic zones of the process evolution with the acetylene supply. The evolution of discharge voltage was correlated with the evolution of the state of the target and OES. At zone I, for low acetylene supply, the discharge voltage and H line intensity increase and the initially pure Ti racetrack is getting covered by TiC. At zone II, for medium acetylene supply, the discharge voltage slightly decreases, H line intensity increases and the racetrack is covered mainly by TiC. At zone III, for high acetylene supply, discharge voltage sharply increases and H line intensity decreases and the racetrack is getting covered by C layer. Ti lines decrease in all three zones. The coating with the highest hardness was prepared at the conditions close to boundary between zone II and III.

Návaznosti

ED2.1.00/03.0086, projekt VaV

Název: Regionální VaV centrum pro nízkonákladové plazmové a nanotechnologické povrchové úpravy

GAP205/12/0407, projekt VaV

Název: Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev

Investor: Grantová agentura ČR, Porozumění hybridnímu PVD-PECVD procesu s cílem řídit růst nanostrukturovaných kompozitních vrstev

Citovat

VAŠINA, Petr, Tereza SCHMIDTOVÁ, Pavel SOUČEK a Vilma BURŠÍKOVÁ. Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition. In E-MRS 2012 Spring Meeting. 2012.

@proceedings{1069224,
   author = {Vašina, Petr and Schmidtová, Tereza and Souček, Pavel and Buršíková, Vilma},
   booktitle = {E-MRS 2012 Spring Meeting},
   keywords = {hybrid PVD-PECVD; magnetron sputtering; metal/carbon},
   language = {eng},
   title = {Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition},
   year = {2012}
}

TY  - CONF
ID  - 1069224
AU  - Vašina, Petr - Schmidtová, Tereza - Souček, Pavel - Buršíková, Vilma
PY  - 2012
TI  - Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition
KW  - hybrid PVD-PECVD
KW  - magnetron sputtering
KW  - metal/carbon
N2  - Hybrid PVD-PECVD process of titanium sputtering in mixture of argon and acetylene combines aspects of both conventional techniques: sputtering of titanium target (PVD) and deposition from acetylene which acts as a source of carbon for polymerization (PECVD). This contribution reports and corelates both the properties of the deposited coating and the deposition process characteristics. nc-TiC/a-C:H coating with hardness and Young’s modulus over 40 GPa and 400 GPa respectively with adhesion in range HF0-HF1 on Ti coated HSS and WC were prepared. Hysteresis free and non-monotonous evolution of discharge voltage determines three characteristic zones of the process evolution with the acetylene supply. The evolution of discharge voltage was correlated with the evolution of the state of the target and OES. At zone I, for low acetylene supply, the discharge voltage and H line intensity increase and the initially pure Ti racetrack is getting covered by TiC. At zone II, for medium acetylene supply, the discharge voltage slightly decreases, H line intensity increases and the racetrack is covered mainly by TiC. At zone III, for high acetylene supply, discharge voltage sharply increases and H line intensity decreases and the racetrack is getting covered by C layer. Ti lines decrease in all three zones. The coating with the highest hardness was prepared at the conditions close to boundary between zone II and III.
ER  -

VAŠINA, Petr, Tereza SCHMIDTOVÁ, Pavel SOUČEK a Vilma BURŠÍKOVÁ. Study of hybrid PVD-PECVD process and its application for metal/carbon film deposition. In \textit{E-MRS 2012 Spring Meeting}. 2012.

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