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@inproceedings{1070545,
author = {Nekvapil, Jakub and Vašina, Petr and Schmidtová, Tereza},
address = {Brno},
booktitle = {Potential and Applications of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstracts},
edition = {1.},
keywords = {reactive magnetron sputtering; hydrogen},
howpublished = {tištěná verze "print"},
language = {eng},
location = {Brno},
isbn = {978-80-210-5979-5},
pages = {126-127},
publisher = {Masaryk University},
title = {Influence of hydrogen on behaviour of reactive magnetron sputtering},
year = {2012}
}
TY - JOUR
ID - 1070545
AU - Nekvapil, Jakub - Vašina, Petr - Schmidtová, Tereza
PY - 2012
TI - Influence of hydrogen on behaviour of reactive magnetron sputtering
PB - Masaryk University
CY - Brno
SN - 9788021059795
KW - reactive magnetron sputtering
KW - hydrogen
N2 - This work studies reactive magnetron sputtering in mixtures of the gases Ar, O2 and H2. The main part is formed by analyzes the hysteresis of the deposition process for the mixtures Ar+O2, Ar+H2 separately and comparison of the results with behaviour of the system for the Ar+O2+H2 mixture. Behaviour of the system is studied for the case of deposition titanium oxide layer.
ER -
NEKVAPIL, Jakub, Petr VAŠINA a Tereza SCHMIDTOVÁ. Influence of hydrogen on behaviour of reactive magnetron sputtering. In \textit{Potential and Applications of Surface Nanotreatment of Polymers and Glass: Book of Extended Abstracts}. 1. vyd. Brno: Masaryk University, 2012, s.~126-127. ISBN~978-80-210-5979-5.
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